Patents by Inventor Adrian Devasahavam

Adrian Devasahavam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9347127
    Abstract: An ion etch assisted deposition apparatus deposits a thin film upon a substrate having a three dimensional feature, using an ion etching source and deposition source arranged at similar angles relative to the substrate and at an angle ? relative to each other. The angle ? is selected to be substantially equal the supplement of the angle ?? formed between the three dimensional feature on the substrate and the substrate surface. In this configuration the relative flux of energetic etch ions and deposition atoms is adjusted to prevent the growth of poor quality deposited material.
    Type: Grant
    Filed: July 16, 2012
    Date of Patent: May 24, 2016
    Assignee: Veeco Instruments, Inc.
    Inventors: Boris L. Druz, Vincent Ip, Adrian Devasahavam