Abstract: A semiconductor device includes: a semiconductor region of a first conductivity type having a main surface; a capacitor region of a second conductivity type formed in a surface layer portion of the main surface; and at least one trench structure including a trench formed in the main surface to penetrate the capacitor region, an insulating film covering a wall surface of the trench, and embedded electrodes embedded in the trench so as to form capacitive coupling with the capacitor region through the insulating film.

Abstract: Disclosed herein is a clamper including a current source that is connected between an external electrode and an internal node and generates a predetermined constant current, a diode having an anode connected to the internal node, and a current mirror that generates a second current corresponding to a first current flowing via the diode and draws the second current from the internal node to a reference voltage node.

Abstract: Disclosed is a gate control circuit that generates a gate control signal of an output transistor connected between an application end of a power supply voltage and an application end of an output voltage. The gate control circuit includes a first current source connected between the application end of the power supply voltage and the application end of the output voltage, a second current source connected between an application end of a booster voltage and an application end of a reference voltage, the booster voltage being raised to a voltage value higher than the power supply voltage in a steady state, an output stage that uses at least one of the first and second current sources to generate a gate charge current for charging a gate of the output transistor, and a controller that uses at least one of the first and second current sources according to the output voltage.

Abstract: An overcurrent protection circuit includes: a first transistor and a second transistor configured to form an amplifier input stage that receives input of a detection signal according to a monitoring target current; and a third transistor configured to form an amplifier output stage that generates a current output signal according to a difference between the detection signal and a reference signal and causes the current output signal to be negatively fed back to the amplifier input stage, wherein the monitoring target current is limited based on the current output signal output from the third transistor.

Abstract: A semiconductor device includes a semiconductor layer of a first conductivity type having a main surface at which a trench is formed, a gate insulating layer formed along a side wall of the trench, a gate electrode embedded in the trench with the gate insulating layer interposed therebetween and having an upper surface located below the main surface of the semiconductor layer, a second conductivity type region formed in a surface layer portion of the main surface of the semiconductor layer and facing the gate electrode with the gate insulating layer interposed therebetween, a first conductivity type region formed in a surface layer portion of the second conductivity type region and facing the gate electrode with the gate insulating layer interposed therebetween, and a side wall insulating layer covering the side wall of the trench in a recessed portion defined by the side wall of the trench and the upper surface of the gate electrode.

Abstract: A semiconductor device includes a semiconductor layer of a first conductivity type having a main surface at which a trench is formed, a gate insulating layer formed along a side wall of the trench, a gate electrode embedded in the trench with the gate insulating layer interposed therebetween and having an upper surface located below the main surface of the semiconductor layer, a second conductivity type region formed in a surface layer portion of the main surface of the semiconductor layer and facing the gate electrode with the gate insulating layer interposed therebetween, a first conductivity type region formed in a surface layer portion of the second conductivity type region and facing the gate electrode with the gate insulating layer interposed therebetween, and a side wall insulating layer covering the side wall of the trench in a recessed portion defined by the side wall of the trench and the upper surface of the gate electrode.