Patents by Inventor Adrian Q. Montgomery

Adrian Q. Montgomery has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adjusting a spacing between a gas distribution member and a substrate support
    Patent number: 7754282
    Abstract: A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: July 13, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kun Victor Wang
  • In Situ Substrate Holder Leveling Method and Apparatus
    Publication number: 20080286444
    Abstract: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate.
    Type: Application
    Filed: July 30, 2008
    Publication date: November 20, 2008
    Applicant: Applied Materials, Inc.
    Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kung Victor Wang
  • In situ substrate holder leveling method and apparatus
    Patent number: 7413612
    Abstract: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate.
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: August 19, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Kirby Floyd, Adrian Q. Montgomery, Jennifer Gonzales, Won Bang, Rong Pan, Amna Mohammed, Yen-Kung Victor Wang