Patents by Inventor Adrian Staicu

Adrian Staicu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography
    Patent number: 9304406
    Abstract: A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: April 5, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Adrian Staicu, Martin Endres
  • OPTICAL COMPONENT
    Publication number: 20160077442
    Abstract: An optical component includes a mechanism for reducing a radiation-induced influence on the displacement of an optical device.
    Type: Application
    Filed: November 13, 2015
    Publication date: March 17, 2016
    Inventors: Adrian Staicu, Johannes Eisenmenger
  • FIELD FACET MIRROR FOR AN ILLUMINATION OPTICS OF A PROJECTION EXPOSURE APPARATUS FOR EUV MICROLITHOGRAPHY
    Publication number: 20140218709
    Abstract: A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput.
    Type: Application
    Filed: April 11, 2014
    Publication date: August 7, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Adrian Staicu, Martin Endres
  • Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography
    Patent number: 8717541
    Abstract: A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: May 6, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Adrian Staicu, Martin Endres
  • FIELD FACET MIRROR FOR AN ILLUMINATION OPTICS OF A PROJECTION EXPOSURE APPARATUS FOR EUV MICROLITHOGRAPHY
    Publication number: 20110164233
    Abstract: A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput.
    Type: Application
    Filed: February 24, 2011
    Publication date: July 7, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Adrian Staicu, Martin Endres