Abstract: A method of fabricating at least one nanochannel in a semiconductor material applied on a substrate, comprising the semiconductor material being subjected to an etching treatment and the substrate to a bonding treatment so as to attach a covering layer to the substrate, in which bonding treatment the semiconductor material is applied as bonding agent, and wherein prior to etching, the semiconductor material is locally doped for the formation of electrodes.

Abstract: A device for carrying out a reaction, which device comprises a wafer provided with a group of at least two wells. The wells are thermally separate from each other by means of a groove in a layer of the device, while parts separated by the groove are locally connected by bridges. In this way a device is provided combining great mechanical strength with good thermal insulation.

Abstract: Electrophoretic system having a separation system and a detection system, where the separation system has a channel (1) and a first separation electrode (2) located at a first end of the channel (1) and a second separation electrode (3) located at the second end of the channel (1), where the separation system is arranged in such a way that a potential difference can be applied between the first and second separation electrode (2, 3), where the detection system, in use, is positioned close to the channel (1) or inside the channel (1), the system having elements to reduce a voltage difference between the separation system and the detection system in order to prevent electrical breakthrough between the separation system and the detection system.