Patents by Inventor Adrianus Cornelius Antonius Jonkers

Adrianus Cornelius Antonius Jonkers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus comprising a gas flushing system
    Patent number: 7106412
    Abstract: A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: September 12, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Klaas De Bokx, Tjarko Adriaan Rudolf Van Empel, Ronald Johannes Hultermans, Adrianus Cornelius Antonius Jonkers
  • Lithographic apparatus comprising a gas flushing system
    Publication number: 20040212791
    Abstract: A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
    Type: Application
    Filed: February 12, 2004
    Publication date: October 28, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Klaas De Bokx, Tjarko Adriaan Rudolf Van Empel, Ronald Johannes Hultermans, Adrianus Cornelius Antonius Jonkers