Patents by Inventor Adrianus Engelen

Adrianus Engelen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method and exchangeable optical element
    Publication number: 20070177122
    Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
    Type: Application
    Filed: January 30, 2006
    Publication date: August 2, 2007
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Erik Loopstra, Adrianus Engelen, Bernardus Luttikhuis, Maria Rubingh, Johannes Hazenberg, Laurentius Jorritsma, Johannes Klerk, Bernhard Geuppert, Aart Van Beuzekom, Petrus Franciscus Mandigers, Franz Sorg, Peter Deufel
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050174550
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: October 15, 2004
    Publication date: August 11, 2005
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Baselmans, Adrianus Engelen, Jozef Finders, Paul Graeupner, Johannes Catharinus Mulkens, Jan Bernard Van Schoot