Patents by Inventor Adrianus Fransiscus Petrus Engelen

Adrianus Fransiscus Petrus Engelen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process
    Patent number: 9696635
    Abstract: A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: July 4, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Adrianus Fransiscus Petrus Engelen, Henricus Johannes Lambertus Megens, Johannes Catharinus Hubertus Mulkens, Robert Kazinczi, Jen-Shiang Wang
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110211181
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: May 6, 2011
    Publication date: September 1, 2011
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080170215
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Application
    Filed: March 17, 2008
    Publication date: July 17, 2008
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Pechelmus Van Schoot