Patents by Inventor Adrianus Hendrik Koevoets
Adrianus Hendrik Koevoets has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180321602Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.Type: ApplicationFiled: October 5, 2016Publication date: November 8, 2018Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Adrianus Hendrik KOEVOETS, Michael Leo NELSON, Jacobus Cornelis Gerardus VAN DER SANDEN, Geoffrey O'CONNOR, Michael Andrew CHIEDA, Tammo UITTERDIJK
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Patent number: 10120292Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: October 18, 2016Date of Patent: November 6, 2018Assignee: ASML NETHERLANDS, B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 10018926Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.Type: GrantFiled: May 7, 2015Date of Patent: July 10, 2018Assignee: ASML NETHERLANDS, B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Christianus Wilhelmus Johannes Berendsen, Andre Bernardus Jeunink, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Siegfried Alexander Tromp, Van Vuong Vy, Daniel Elza Roeland Audenaerdt
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Publication number: 20180173116Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: ApplicationFiled: April 4, 2016Publication date: June 21, 2018Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik KOEVOETS, Erik Johan ARLEMARK, Sander Catharina Reinier DERKS, Sjoerd Nicolaas Lambertus DONDERS, Wilfred Edward ENDENDIJK, Franciscus Johannes Joseph JANSSEN, Raymond Wilhelmus Louis LAFARRE, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Nicolaas TEN KATE, Jacobus Cornelis Gerardus VAN DER SANDEN
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Patent number: 9983489Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.Type: GrantFiled: April 24, 2015Date of Patent: May 29, 2018Assignee: ASML Netherlands B.V.Inventors: Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets, Leon Martin Levasier, Peter Schaap, Bob Streefkerk, Siegfried Alexander Tromp
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Patent number: 9939738Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: July 16, 2015Date of Patent: April 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent
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Publication number: 20180067398Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.Type: ApplicationFiled: May 7, 2015Publication date: March 8, 2018Inventors: Rogier Hendrikus Magdalena CORTIE, Christianus Wilhelmus Berendsen, Andre Bernardus Jeunink, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Sigfried Alexander Tromp, Van Vuong Vy, Daniel Elza Roeland Audenaerdt
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Publication number: 20170212429Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: ApplicationFiled: July 16, 2015Publication date: July 27, 2017Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik KOEVOETS, Christianus Wilhelmus Johannes BERENDSEN, Rogier Hendrikus Magdalena CORTIE, Jim Vincent OVERKAMP, Patricius Jacobus NEEFS, Putra SAPUTRA, Ruud Hendrikus Martinus Johannes BLOKS, Michael Johannes Hendrika Wilhelmina RENDERS, Johan Gertrudis Cornelis KUNNEN, Thibault Simon Mathieu LAURENT
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Patent number: 9696640Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.Type: GrantFiled: May 2, 2013Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Harmeet Singh
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Patent number: 9684249Abstract: A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.Type: GrantFiled: January 25, 2013Date of Patent: June 20, 2017Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Theodorus Petrus Maria Cadee
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Publication number: 20170115578Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.Type: ApplicationFiled: April 24, 2015Publication date: April 27, 2017Applicant: ASML Netherlands B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Marcel BECKERS, Henricus Jozef CASTELIJNS, Hubertus Antonius GERAETS, Adrianus Hendrik KOEVOETS, Leon Martin LEVASIER, Peter SCHAAP, Bob STREEFKERK, Siegfried Alexander TROMP
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Patent number: 9618859Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.Type: GrantFiled: January 25, 2013Date of Patent: April 11, 2017Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Jan Bernard Plechelmus Van Schoot, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee
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Publication number: 20170090304Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: October 18, 2016Publication date: March 30, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johanne De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Patent number: 9507275Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: May 17, 2013Date of Patent: November 29, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
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Publication number: 20160195823Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.Type: ApplicationFiled: February 17, 2016Publication date: July 7, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Andre Bernardus Jeunink, Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Frederik Dijksman, Carolus Johannes Catharina Schoormans, Adrianus Hendrik Koevoets, Catharinus De Schiffart, Sander Frederik Wuister
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Patent number: 9310700Abstract: In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.Type: GrantFiled: July 18, 2011Date of Patent: April 12, 2016Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Michael Jozef Mathijs Renkens, Sander Frederik Wuister
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Patent number: 9122173Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.Type: GrantFiled: February 17, 2012Date of Patent: September 1, 2015Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Robertus Johannes Marinus De Jongh, Michael Jozef Mathijs Renkens, Marc Wilhelmus Maria Van Der Wijst, Maurice Willem Jozef Etiƫnne Wijckmans, Robertus Leonardus Tousain, Ronald Petrus Hendricus Faassen, Adrianus Hendrik Koevoets
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Publication number: 20150109599Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: ApplicationFiled: May 17, 2013Publication date: April 23, 2015Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Raymond Wilhelmus Louis Laffarre, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum, Robert De Jong
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Publication number: 20150098067Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.Type: ApplicationFiled: May 2, 2013Publication date: April 9, 2015Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Harmeet Singh
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Patent number: 8922756Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.Type: GrantFiled: August 20, 2012Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Willem Herman Gertruda Anna Koenen, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen, Adrianus Hendrik Koevoets