Patents by Inventor Adrianus Johannes Henricus Maas

Adrianus Johannes Henricus Maas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
    Patent number: 7728956
    Abstract: A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: June 1, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Kars Zeger Troost, Adrianus Johannes Henricus Maas
  • Lithographic apparatus and device manufacturing method
    Patent number: 7315346
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: January 1, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Cornelis Van Beek, Levinus Pieter Bakker, Theodorus Hubertus Josephus Bisschops, Jeroen Jonkers, Mark Kroon, Robertus Adrianus Maria Wolters, Adrianus Johannes Henricus Maas
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040165160
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.
    Type: Application
    Filed: December 12, 2003
    Publication date: August 26, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michael Cornelis Van Beek, Levinus Pieter Bakker, Theodorus Hubertus Josephus Bisschops, Jeroen Jonkers, Mark Kroon, Robertus Adrianus Maria Wolters, Adrianus Johannes Henricus Maas