Patents by Inventor Adrianus Martinus Van der Wielen
Adrianus Martinus Van der Wielen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9958788Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: January 12, 2017Date of Patent: May 1, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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Patent number: 9857694Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.Type: GrantFiled: March 5, 2015Date of Patent: January 2, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bearrach Moest, Peter A. Delmastro, Johannes Onvlee, Adrianus Martinus Van Der Wielen, Christopher Charles Ward
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Publication number: 20170123323Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: January 12, 2017Publication date: May 4, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy PROSYENTSOV, Willem Jurrianus VENEMA, Kars Zeger TROOST, Adrianus Martinus VAN DER WIELEN
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Publication number: 20170068171Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.Type: ApplicationFiled: March 5, 2015Publication date: March 9, 2017Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bearrach MOEST, Peter A. DELMASTRO, Johannes ONVLEE, Adrianus Martinus VAN DER WIELEN, Christopher Charles WARD
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Patent number: 9568833Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: October 10, 2014Date of Patent: February 14, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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Patent number: 9417533Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: GrantFiled: November 29, 2011Date of Patent: August 16, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van der Wielen
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Publication number: 20150029481Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: October 10, 2014Publication date: January 29, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy PROSYENTSOV, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van Der Wielen
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Publication number: 20120133914Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.Type: ApplicationFiled: November 29, 2011Publication date: May 31, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Vitaliy Prosyentsov, Willem Jurrianus Venema, Kars Zeger Troost, Adrianus Martinus Van der Wielen