Patents by Inventor Aduato Diaz

Aduato Diaz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR REMOVING BYPRODUCTS FROM LOAD LOCK CHAMBERS
    Publication number: 20110304078
    Abstract: Methods for removing process byproducts from a load lock chamber are provided herein. In some embodiments, a method for removing process byproducts from a load lock chamber may include: performing a process on a substrate disposed within a process chamber; transferring the substrate from the process chamber to a load lock chamber; and providing an inert gas to the load lock chamber via at least one gas line while transferring the substrate from the process chamber to the load lock chamber to remove process byproducts from the load lock chamber.
    Type: Application
    Filed: January 27, 2011
    Publication date: December 15, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: JARED AHMAD LEE, BENJAMIN SCHWARZ, XIAOLIANG ZHUANG, EU JIN LIM, ADUATO DIAZ, JR., SCOTT M. WILLIAMS, ANDREW NGUYEN, JAMES P. CRUSE
  • Method and apparatus for providing modulated bias power to a plasma etch reactor
    Publication number: 20030153195
    Abstract: A method and apparatus for modulating the bias power applied to a wafer support pedestal within a plasma etch reactor. The modulation has an on/off duty cycle of between 10 and 90 percent. Such modulation of the bias power substantially improves the verticality of the etched features located near the edge of a semiconductor wafer as the wafer is being etched in a plasma etch reactor.
    Type: Application
    Filed: February 13, 2002
    Publication date: August 14, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Elisabeth Weikmann, Aduato Diaz, Sharma V. Pamarthy, Ajay Kumar, Padmapani C. Nallan