Patents by Inventor Advanced Technology Materials, Inc.

Advanced Technology Materials, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130137250
    Abstract: Methods of implanting boron-containing ions using fluorinated boron-containing dopant species that are more readily cleaved than boron trifluoride. A method of manufacturing a semiconductor device including implanting boron-containing ions using fluorinated boron-containing dopant species that are more readily cleaved than boron trifluoride. Also disclosed are a system for supplying a boron hydride precursor, and methods of forming a boron hydride precursor and methods for supplying a boron hydride precursor. In one implementation of the invention, the boron hydride precursors are generated for cluster boron implantation, for manufacturing semiconductor products such as integrated circuitry.
    Type: Application
    Filed: December 26, 2012
    Publication date: May 30, 2013
    Applicant: Advanced Technology Materials, Inc.
    Inventor: Advanced Technology Materials, Inc.
  • Publication number: 20130078790
    Abstract: A method of implanting carbon ions into a target substrate, including: ionizing a carbon containing dopant material to produce a plasma having ions; optionally co-flowing an additional gas or series of gases with the carbon-containing dopant material; and implanting the ions into the target substrate. The carbon-containing dopant material is of the formula CwFxOyHz wherein if w=1, then x>0 and y and z can take any value, and wherein if w>1 then x or y is >0, and z can take any value. Such method significantly improves the efficiency of an ion implanter tool, in relation to the use of carbon source gases such as carbon monoxide or carbon dioxide.
    Type: Application
    Filed: November 20, 2012
    Publication date: March 28, 2013
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventor: Advanced Technology Materials, Inc.
  • Publication number: 20130072411
    Abstract: A semiconductor wafer cleaning formulation, including 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40% wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an imine, 20-50% wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.
    Type: Application
    Filed: October 23, 2012
    Publication date: March 21, 2013
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventor: Advanced Technology Materials, Inc.
  • Publication number: 20130056112
    Abstract: Fluid supply systems for storage and dispensing of chemical reagents and compositions, e.g., high purity liquid reagents and chemical mechanical polishing compositions used to manufacture microelectronic device products, having capability for detection of an empty or near-empty condition when the contained liquid is at or approaching depletion during dispensing operation. Fluid delivery systems employing empty detect arrangements are described, including pressure transducer monitoring of dispensed material intermediate the supply package and a servo-hydraulic dispense pump, or monitoring of dispenser chamber replenishment times in a dispenser being replenished on a cyclic schedule to flow material from the dispenser to a downstream tool utilizing the dispensed material.
    Type: Application
    Filed: November 2, 2012
    Publication date: March 7, 2013
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventor: Advanced Technology Materials, Inc.