Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provides power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract: An apparatus includes a plasma generator aligned with a beam generator for producing a plasma to shield an energized beam. An electrode is coaxially aligned with the plasma generator and followed in turn by a vortex generator coaxially aligned with the electrode. A target is spaced from the vortex generator inside a fluid environment. The electrode is electrically biased relative to the electrically grounded target for driving the plasma toward the target inside a vortex shield.

Abstract: An apparatus includes a plasma generator aligned with a beam generator for producing a plasma to shield an energized beam. An electrode is coaxially aligned with the plasma generator and followed in turn by a vortex generator coaxially aligned with the electrode. A target is spaced from the vortex generator inside a fluid environment. The electrode is electrically biased relative to the electrically grounded target for driving the plasma toward the target inside a vortex shield.

Abstract: A plasma valve includes a confinement channel and primary anode and cathode disposed therein. An ignition cathode is disposed adjacent the primary cathode. Power supplies are joined to the cathodes and anode for rapidly igniting and maintaining a plasma in the channel for preventing leakage of atmospheric pressure through the channel.

Abstract: A method and apparatus are provided for propagating charged particles from a vacuum to a higher pressure region. A generator 14,14b includes an evacuated chamber 16a,b having a gun 18,18b for discharging a beam of charged particles such as an electron beam 12 or ion beam 12b. The beam 12,12b is discharged through a beam exit 22 in the chamber 16a,b into a higher pressure region 24. A plasma interface 34 is disposed at the beam exit 22 and includes a plasma channel 38 for bounding a plasma 40 maintainable between a cathode 42 and an anode 44 disposed at opposite ends thereof. The plasma channel 38 is coaxially aligned with the beam exit 22 for propagating the beam 12,12b from the chamber 16a,b, through the plasma 40, and into the higher pressure region 24. The plasma 40 is effective for pumping down the beam exit 22 for preventing pressure increase in the chamber 16a,b, and provides magnetic focusing of the beam 12,12b discharged into the higher pressure region 24.

Abstract: An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source.

Abstract: An electronic device of the type wherein current flow is conducted by an ionized gas comprising a cathode of the type heated by ionic bombardment, an anode, means for maintaining a predetermined pressure in the region between the anode and the cathode and means for maintaining a field in the region. The field, which is preferably a combined magnetic and electric field, is oriented so that the mean distance traveled by electrons before reaching the anode is increased. Because of this increased distance traveled electrons moving to the anode will ionize a larger number of gas atoms, thus reducing the voltage necesary to initiate gas breakdown. In a preferred embodiment the anode is a main hollow cathode and the cathode is a smaller igniter hollow cathode located within and coaxial with the main hollow cathode. An axial magnetic field is provided in the region between the hollow cathodes in order to facilitate gas breakdown in that region and initiate plasma discharge from the main hollow cathode.

Abstract: A process for selectively neutralizing H.sup.- ions in a magnetic field to produce an intense negative hydrogen ion beam with spin polarized protons. Characteristic features of the process include providing a multi-ampere beam of H.sup.- ions that are intersected by a beam of laser light. Photodetachment is effected in a uniform magnetic field that is provided around the beam of H.sup.- ions to spin polarize the H.sup.- ions and produce first and second populations or groups of ions, having their respective proton spin aligned either with the magnetic field or opposite to it. The intersecting beam of laser light is directed to selectively neutralize a majority of the ions in only one population, or given spin polarized group of H.sup.- ions, without neutralizing the ions in the other group thereby forming a population of H.sup.- ions each of which has its proton spin down, and a second group or population of H.sup.o atoms having proton spin up.

Abstract: A negative ion source of the type where negative ions are formed by bombarding a low-work-function surface with positive ions and neutral particles from a plasma, wherein a highly ionized plasma is injected into an anode space containing the low-work-function surface. The plasma is formed by hollow cathode discharge and injected into the anode space along the magnetic field lines. Preferably, the negative ion source is of the magnetron type.