Abstract: The present invention relates to an acidic aqueous composition for treating of zirconium-pretreated metal-based substrate surfaces such as steel metals or aluminium surfaces, a process for treating the substrate surfaces with the composition and the use of the composition as post-treatment of zirconium-pretreated metal-based substrate surfaces for subsequent electrocoating of the surfaces to increase corrosion resistance of said metal-based surfaces prior to electro-coating (e-coat) applications and increases detergent and chemical resistance of treated surfaces used in the white goods industry. The acidic aqueous composition comprises trivalent chromium ions; and hexafluorozirconate ions; characterized in that the source of trivalent chromium ions is a trivalent chromium nitrate salt.

Abstract: The present invention relates to an acidic aqueous composition for treating of zirconium-pretreated metal-based substrate surfaces such as steel metals or aluminium surfaces, a process for treating the substrate surfaces with the composition and the use of the composition as post-treatment of zirconium-pretreated metal-based substrate surfaces for subsequent electrocoating of the surfaces to increase corrosion resistance of said metal-based surfaces prior to electro-coating (e-coat) applications and increases detergent and chemical resistance of treated surfaces used in the white goods industry. The acidic aqueous composition comprises trivalent chromium ions; and hexafluorozirconate ions; characterized in that the source of trivalent chromium ions is a trivalent chromium nitrate salt.

Abstract: An electrodeposited crystalline functional chromium deposit which is nanogranular as deposited, and the deposit may be both TEM and XRD crystalline or may be TEM crystalline and XRD amorphous. In various embodiments, the deposit includes one or any combination of two or more of an alloy of chromium, carbon, nitrogen, oxygen and sulfur; a {111} preferred orientation; an average crystal grain cross-sectional area of less than about 500 nm2; and a lattice parameter of 2.8895+/?0.0025 A. A process and an electrodeposition bath for electrodepositing the nanogranular crystalline functional chromium deposit on a substrate, including providing the electrodeposition bath including trivalent chromium, a source of divalent sulfur, a carboxylic acid, a source of nitrogen and being substantially free of hexavalent chromium; immersing a substrate in the bath; and applying an electrical current to electrodeposit the deposit on the substrate.

Abstract: An electroplating bath and a process for electrodepositing a crystalline chromium deposit on a substrate, in which the electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited, and/or has a lattice parameter of 2.8895+/?0.0025 ?, and/or the crystalline chromium deposit has a {111} preferred orientation.

Abstract: A crystalline chromium deposit having a lattice parameter of 2.8895+/?0.0025 ?, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.

Abstract: An electrodeposited crystalline functional chromium deposit which is nanogranular as deposited, and the deposit may be both TEM and XRD crystalline or may be TEM crystalline and XRD amorphous. In various embodiments, the deposit includes one or any combination of two or more of an alloy of chromium, carbon, nitrogen, oxygen and sulfur; a {111} preferred orientation; an average crystal grain cross-sectional area of less than about 500 nm2; and a lattice parameter of 2.8895+/?0.0025 A. A process and an electrodeposition bath for electrodepositing the nanogranular crystalline functional chromium deposit on a substrate, including providing the electrodeposition bath including trivalent chromium, a source of divalent sulfur, a carboxylic acid, a source of nitrogen and being substantially free of hexavalent chromium; immersing a substrate in the bath; and applying an electrical current to electrodeposit the deposit on the substrate.

Abstract: A crystalline chromium deposit having a lattice parameter of 2.8895±0.0025 ?, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.