Patents by Inventor Ahn-Ho Lee

Ahn-Ho Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thinner compositions
    Patent number: 9885955
    Abstract: A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: February 6, 2018
    Assignees: Samsung Electronics Co., Ltd., Dongwoo Fine-Chem
    Inventors: Ahn-Ho Lee, Seung-Hyun Ahn, Jin-Seok Yang, Sang-Tae Kim, Shi-Jin Sung, Kyong-Ho Lee
  • Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same
    Patent number: 9845444
    Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: December 19, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ahn-Ho Lee, Chung-Kyung Jung, Dong-Min Kang, Dong-Hun Kang, Go-Un Kim, Dong-Jin Kim, Yong-Sik Yoo, Young-Chul Jung, Yu-Ri Jung, Jung-Min Choi, Sang-Kyun Kim
  • THINNER COMPOSITIONS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
    Publication number: 20160202610
    Abstract: A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.
    Type: Application
    Filed: January 11, 2016
    Publication date: July 14, 2016
    Inventors: Ahn-Ho LEE, Seung-Hyun AHN, Jin-Seok YANG, Sang-Tae KIM, Shi-Jin SUNG, Kyong-Ho LEE
  • CLEANING COMPOSITION AFTER CHEMICAL MECHANICAL POLISHING OF ORGANIC FILM AND CLEANING METHOD USING THE SAME
    Publication number: 20160137953
    Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 19, 2016
    Inventors: Ahn-Ho LEE, Chung-Kyung JUNG, Dong-Min KANG, Dong-Hun KANG, Go-Un KIM, Dong-Jin KIM, Yong-Sik YOO, Young-Chul JUNG, Yu-Ri JUNG, Jung-Min CHOI, Sang-Kyun KIM
  • Methods of forming a photosensitive film
    Patent number: 8227182
    Abstract: In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of ?-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
    Type: Grant
    Filed: August 11, 2009
    Date of Patent: July 24, 2012
    Assignees: Samsung Electronics Co., Ltd., Dongwoo Fine-Chem Co., Ltd.
    Inventors: Ahn-Ho Lee, Baik-Soon Choi, Seung-Hyun Ahn, Sang-Tae Kim, Yong-Il Kim, Shi-Jin Sung, Kyong-Ho Lee
  • Photosensitive-resin remover composition and method of fabricating semiconductor device using the same
    Patent number: 8129322
    Abstract: A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: March 6, 2012
    Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.
    Inventors: Ahn-Ho Lee, Junghun Lim, Young Taek Hong, Hyuntak Kim, Seonghwan Park, Baiksoon Choi, Seunghyun Ahn, Byungil Lee
  • PHOTOSENSITIVE-RESIN REMOVER COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20110218134
    Abstract: A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
    Type: Application
    Filed: March 3, 2011
    Publication date: September 8, 2011
    Inventors: Ahn-Ho Lee, Junghun Lim, Young Taek Hong, Hyuntak Kim, Seonghwan Park, Baiksoon Choi, Seunghyun Ahn, Byungil Lee
  • Methods of Forming a Photosensitive Film
    Publication number: 20100034962
    Abstract: In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of ?-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
    Type: Application
    Filed: August 11, 2009
    Publication date: February 11, 2010
    Inventors: Ahn-Ho LEE, Baik-Soon CHOI, Seung-Hyun AHN, Sang-Tae KIM, Yong-II KIM, Shi-Jin SUNG, Kyong-Ho LEE