Patents by Inventor Ai Endou

Ai Endou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist stripping composition and method of producing semiconductor device using the same
    Patent number: 7087563
    Abstract: A resist stripping composition capable of reliably stripping off resist residue or polymer residue and keeping damage to the interconnects to a minimum and a method of producing a semiconductor device using the same, where the resist stripping composition comprises a salt of hydrofluoric acid and a base not including a metal, an organic solvent, a sugar alcohol such as xylitol, and water and has a hydrogen ion concentration of at least 8.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 8, 2006
    Assignees: Sony Corporation, EKC Technology K.K.
    Inventors: Hayato Iwamoto, Ryuichi Kanamura, Ai Endou, Tomoko Suzuki, Toshitaka Hiraga
  • Composition for releasing a resist and method for manufacturing semiconductor device using the same
    Publication number: 20040081924
    Abstract: A resist stripping composition capable of reliably stripping off resist residue or polymer residue and keeping damage to the interconnects to a minimum and a method of producing a semiconductor device using the same, where the resist stripping composition comprises a salt of hydrofluoric acid and a base not including a metal, an organic solvent, a sugar alcohol such as xylitol, and water and has a hydrogen ion concentration of at least 8.
    Type: Application
    Filed: August 4, 2003
    Publication date: April 29, 2004
    Inventors: Hayato Iwamoto, Ryuichi Kanamura, Ai Endou, Tomoko Suzuki, Toshitaka Hiraga