Patents by Inventor Ai Koh

Ai Koh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230172467
    Abstract: According to embodiments of the present invention, a gateway device operable in a system for monitoring a plurality of bio-signals is provided. The gateway device includes a receiver unit configured to receive data and reconstruct the received data to obtain a digital sound signal representative of the plurality of bio-signals; a processing unit configured to determine at least one biometric from the digital sound signal and form a digital signal representative of the plurality of bio-signals and the determined at least one biometric, and to reconstruct the digital signal into two or more data segments, wherein each data segment includes a portion of the digital signal; and a transmitter unit configured to transmit information including the two or more data segments to an external processing module for further processing. According to further embodiments, a system and a method for monitoring a plurality of bio-signals are also provided.
    Type: Application
    Filed: May 17, 2021
    Publication date: June 8, 2023
    Inventors: Aiman BIN IBRAHIM, Vivian Ci Ai KOH, Siti Hamidah BINTE ABDUL HAMID, Xiao Rex TAN, Yi Yang ANG, Wee SER
  • Patent number: 6245686
    Abstract: A process for forming a semiconductor device includes placing a substrate (104) into an apparatus (300), creating a plasma, and processing the substrate (104). The apparatus (300) includes an electromagnetic source (120), a bulk material (302), and a first barrier layer (304). The bulk material (302) is between the electromagnetic source (120) and an interior (126) of the apparatus (300). The first barrier layer (304) is between the bulk material (302) and the interior (126). A process for operating an apparatus (300) includes forming a polymer layer along an inorganic layer (302, 306or 702), wherein the polymer layer is formed within the apparatus (300); removing the polymer layer to expose the inorganic layer (302, 306, or 702); and etching at least a portion of the exposed inorganic layer (302, 306, or 702). Typically, the inorganic layer (203, 306, or 702) is semiconductive or resistive.
    Type: Grant
    Filed: June 5, 2000
    Date of Patent: June 12, 2001
    Assignee: Motorola Inc.
    Inventors: Jeffrey D. Rose, Michael J. Hartig, David G. Farber, Danny R. Babbitt, Jason A. Rivers, Ai Koh, Terry G. Sparks