Patents by Inventor Aiden Alexander Martin

Aiden Alexander Martin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210138551
    Abstract: The present disclosure relates to a system which may have an electronic controller, an optical light source controlled by the electronic controller which generates a beam having an output power level, and a current measuring subsystem (CMS) electrically coupled to a conductive substrate (e.g., metal substrate (MS)) while a powder bed layer (PBL) is deposited on the MS. The CMS may be in communication with the electronic controller and detects a current flow as at least one of the MS or the PBL is heated when the beam is scanned over the PBL. The CMS generates a current flow signal in accordance with the detected current flow. The current flow signal is used by the electronic controller to determine when the temperature of at least one of the substrate or the PBL is at least one of above or below a desired temperature.
    Type: Application
    Filed: December 18, 2020
    Publication date: May 13, 2021
    Inventors: Aiden Alexander MARTIN, Philip James DEPOND
  • Patent number: 10395923
    Abstract: A method for produce a silicon-carbide film by admitting a gaseous silicon-carbide precursor into a vacuum chamber containing a substrate and directing an electron beam into the vacuum chamber onto to the surface of the substrate. The electron beam dissociates the gaseous silicon-carbide precursor at the surface of the substrate creating non-volatile fragments that bind to the substrate surface forming a silicon-carbide film.
    Type: Grant
    Filed: October 11, 2017
    Date of Patent: August 27, 2019
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Aiden Alexander Martin
  • Publication number: 20190109000
    Abstract: A method for produce a silicon-carbide film by admitting a gaseous silicon-carbide precursor into a vacuum chamber containing a substrate and directing an electron beam into the vacuum chamber onto to the surface of the substrate. The electron beam dissociates the gaseous silicon-carbide precursor at the surface of the substrate creating non-volatile fragments that bind to the substrate surface forming a silicon-carbide film.
    Type: Application
    Filed: October 11, 2017
    Publication date: April 11, 2019
    Inventor: Aiden Alexander Martin
  • Patent number: 10176983
    Abstract: A method for produce a boron containing film by admitting a gaseous boron precursor into a vacuum chamber containing a substrate and directing an electron beam or ion beam into the vacuum chamber onto to the surface of the substrate. The electron beam or ion beam dissociates the gaseous boron precursor at the surface of the substrate creating non-volatile fragments that bind to the substrate surface forming a boron containing film.
    Type: Grant
    Filed: October 11, 2017
    Date of Patent: January 8, 2019
    Assignee: Lawrence Livermore National Security, LLC
    Inventor: Aiden Alexander Martin