Patents by Inventor Aidong WANG

Aidong WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240089010
    Abstract: An on-chip adaptive optical receiver system, an optical chip, and a communication device are disclosed, which are applied to optical communication. The on-chip adaptive optical receiver system includes an antenna array configured for separating received spatial light to obtain a plurality of sub-light spots; an optical phased array configured for performing phase-shifting processing and beam combining processing on the sub-light spots to obtain combined light; and an optical receiving module configured for demultiplexing the combined light to obtain beacon light. The optical receiving module is further configured for detecting intensity information of the beacon light and generating a feedback signal according to the intensity information.
    Type: Application
    Filed: June 28, 2021
    Publication date: March 14, 2024
    Inventors: Caiming Sun, Shupeng Deng, Weiwei Liu, Aidong Zhang, Xiaomin Nie, Zhenmin Chen, Hongjie Wang, Xinke Tang
  • Patent number: 9797089
    Abstract: A method for photocatalytic white discharge printing for achieving patterns on textiles includes closely integrating substrates with patterned printing plates or fixing patterned printing plates on one or both sides of a substrate, placing them in a reactor equipped with a light source and containing the photocatalytic white discharging formulation. The method has the characteristics of a simple process, short processing, easy controlling and wide adaptability. The process eliminates the need for printing plates and expensive printing apparatus used in complicated conventional printing methods. Additionally, the photocatalytic solution can be reused which avoids generous application of chemical agents and waste discharges that are present in conventional printing methods. The method is beneficial for cutting costs, saving energy, reducing emissions and has cleaner production.
    Type: Grant
    Filed: April 2, 2013
    Date of Patent: October 24, 2017
    Assignee: Soochow University
    Inventors: Jiajie Long, Hongmei Xu, Aidong Wang
  • Publication number: 20150337488
    Abstract: A method of photocatalytic white discharge printing for achieving patterns on textiles includes: substrates are closely integrated with patterned printing plates, or patterned printing plates are fixed in one side or both sides of the substrates; then put them in a reactor equipped with a light source and occupied by the photocatalytic white discharging formulation. The method has the characteristics of simple process, short processing, easy controlling and wide adaptability, along with eliminations of the need for printing pastes and expensive printing apparatuses, so as the complicated process in the conventional printing method. Additionally, photocatalytic solution can be reused, avoiding generous applications of chemical agents and waste discharges in the conventional printing method. It is also beneficial to cutting costs, along with significant advantages of energy saving, emission reduction and cleaner production.
    Type: Application
    Filed: April 2, 2013
    Publication date: November 26, 2015
    Inventors: Jiajie LONG, Hongmei XU, Aidong WANG