Abstract: The present invention discloses an image forming system and apparatus and the method for control and troubleshooting. Wherein the image forming apparatus comprises a communication interface unit for communicating with external equipment; a storage unit for storing page data information, wherein said page data information includes page data for image-forming processing; a page order determining unit to determine the image-forming processing order of said page data, i.e., image paging order; an image-forming unit that performs the image-forming processing; and an image sending unit that sends said page data stored in said storage unit to said image-forming unit according to the image paging order determined by said page order determining unit. The present invention is capable of saving the memory resources of the host connected with the image forming apparatus, reducing the purchase cost of the host and achieving a more energy saving and environmentally friendly printing process.

Abstract: The present invention provides a method, device and system for information download processing and information download indication. In the present invention, because an imaging device has been registered with paid web sites successfully when leaving the factory, a user can access the paid web sites only by installing drivers. According to a protocol, the user can access the paid web sites and acquire data by means of the imaging device, and correspondingly, manufacturer of the imaging device pays a fee to the paid web sites. Thereby, after purchasing the imaging device, the user can access the paid web sites to acquire the free data as long as the imaging device is connected to a computer capable of being connected with the Internet and the driver of the imaging device is installed on the computer. The present invention eliminates need for the user to register and pay to obtain paid data.

Abstract: A fabrication process for rendering, for example, amorphous silicon (a-Si) films into polycrystalline silicon (poly-Si) films initially commences with the deposition of the a-Si film on a substrate such as glass. The a-Si film is then exposed to a particle flux (e.g. a plasma or a neutral beam). The resulting treatment apparently causes an action that enhances a subsequent crystallization process. The treatment occurs at a temperature well below any level which causes a change in the substrate. The particle flux treatment is followed by an anneal step that enables a rapid crystallization. By appropriate masking prior to the treatment, crystallization in non-treated areas is prevented while crystallization in treated areas occurs during the anneal procedure.