Patents by Inventor Aimé Perrin

Aimé Perrin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6815902
    Abstract: A device produces an electric field between two electrodes, the electric field having a specified value in the vicinity of a first of the two electrodes. The device includes a means for applying a potential difference between the two electrodes, means forming modulation electrode located near to the first electrode in the vicinity of which the electric field must have specified value. The device also includes control means for applying a potential difference between the means forming modulation electrode and the first electrode located nearby in order to obtain, through the contribution of the potential differences, the specified value of electric field.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: November 9, 2004
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Aimé Perrin, Adeline Fournier, Brigitte Montmayeul
  • Patent number: 6534913
    Abstract: A microtip electron source including at least one electron emission zone composed of a plurality of microtips connected electrically to a cathode conductor. At least one gate electrode is positioned opposite the electron emission zone and pierced with apertures located opposite the microtips, to extract the electrons from the microtips. An emitted electron focusing gate is positioned opposite the gate electrode, and includes an aperture unit including at least one slit located opposite at least two successive microtips. A flat display screen can include such a microtip electron source. Further, a manufacturing process of such an electron source is disclosed.
    Type: Grant
    Filed: May 8, 2000
    Date of Patent: March 18, 2003
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Aimé Perrin, Brigitte Montmayeul, Robert Meyer
  • Patent number: 6509061
    Abstract: An apparatus for depositing a material by evaporation on a substrate having a large surface. The apparatus includes an enclosure in which are placed a number of material evaporation sources. It also includes a device for channeling or piping of vapors emitted by the sources toward the substrate during evaporation. This is formed by walls or covers which define compartments within the enclosure, each evaporation source being placed in a compartment. The apparatus can also utilize a device for moving the substrate in order to improve the uniformity of the deposit.
    Type: Grant
    Filed: October 21, 1997
    Date of Patent: January 21, 2003
    Assignee: Commissariat a l'Energe Atomique
    Inventors: Michel Ida, Aimé Perrin, Michel Borel, Raymond Charles
  • Patent number: 6276981
    Abstract: The invention involves the making of a group of apertures spaced in a precise manner on a structure and including, for example, a first aperture made in a first layer and a second aperture made in a second layer which covers the first layer, the first aperture being located within the second aperture.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: August 21, 2001
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Aimé Perrin, Brigitte Montmayeul, Régis Blanc
  • Patent number: 6210246
    Abstract: A process for manufacturing a micropoint electron source with an extraction grid and a focusing grid. This process allows for precise alignment of the holes of the extraction grid with the apertures of the focusing grid by using a single photolithography step for making the holes in the extraction grid. Such a process may find particular application for making a micropoint electron source for a flat viewing screen.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: April 3, 2001
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Aimé Perrin, Brigitte Montmayeul, Régis Blanc