Patents by Inventor Ainhoa Negreira

Ainhoa Negreira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly
    Patent number: 11538684
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 mn.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: December 27, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Mark H. Somervell, Ian J. Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus
  • UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TEMPLATES FOR DIRECTED SELF-ASSEMBLY
    Publication number: 20200066509
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 mn.
    Type: Application
    Filed: November 1, 2019
    Publication date: February 27, 2020
    Inventors: Mark H. Somervell, Ian J. Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus
  • UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly
    Patent number: 10490402
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 nm.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: November 26, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Mark Somervell, Ian Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus
  • UV-Assisted Stripping of Hardened Photoresist to Create Chemical Templates for Directed Self-Assembly
    Publication number: 20150064917
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 nm.
    Type: Application
    Filed: August 22, 2014
    Publication date: March 5, 2015
    Inventors: Mark Somervell, Ian Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus