Abstract: This disclosure is applicable to the field of optical measurement technology, and provides a method and device for ultrasensitive displacement sensing based on local spin characteristics, the method comprises: using an excitation light to excite and generate a near-field optical vortex field, NF-OV in which a local spin state linearly changes with a position at a detection; coupling the local spin state of the NF-OV to a far-field by using a nanostructure, so as to obtain elliptically polarized light; and detecting the spin degree of elliptically polarized light to obtain displacement information of the position at the detection. The sensing method provided by the disclosure can obtain accurate displacement information, has high sensitivity, low cost and high practical value.

Abstract: A digital exposure apparatus for a color enlarging photo printer is disclosed, in which an exposure unit comprising a Liquid Crystal on Silicon, a polarization splitting prism, a condenser lens, a light source, and a digital enlarging objecting lens, wherein the optical axis of the Liquid Crystal on Silicon, the polarization splitting prism and the digital enlarging objective lens coincides with the optical axis of the printing lamp, the filter and the mixed light barrel. The whole structure of this apparatus is simplified and the light intensity of existing digital exposure apparatus is increased. The technology is advanced so that the digital exposure apparatus will be more productive.

Abstract: This invention is one digital exposure device, which contains: body case; printing lamp, filters, light tunnel, exposure assembly and shutter set in the body case; its character is: the exposure assembly contains: Polarizing Beamsplitters, condensing lens, Liquid Crystal on Silicon Panel, digital enlarging lens and light source. The panel is at the same position of the negative on traditional minilab. Above the Liquid Crystal on Silicon Panel there is Polarizing Beamsplitters. The condensing lens sticks to the outside of the prism and the light source close to the outside of the condensing lens. The digital enlarging lens lies above the prism; the OA of the Liquid Crystal on Silicon Panel, Polarizing Beamsplitters and digital enlarging lens coincides with that of the printing lamp, filters and light tunnel. The whole structure of this device is simplified and the light intensity of existing digital exposure device is increased.