Patents by Inventor Airi Yamada
Airi Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7576223Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: GrantFiled: May 29, 2008Date of Patent: August 18, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Publication number: 20080269506Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: ApplicationFiled: May 29, 2008Publication date: October 30, 2008Inventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Patent number: 7396899Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: GrantFiled: December 22, 2006Date of Patent: July 8, 2008Assignee: Sumitomo Chemical Co., Ltd.Inventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Publication number: 20070123674Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: ApplicationFiled: December 22, 2006Publication date: May 31, 2007Inventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Patent number: 7202010Abstract: A chemical amplification type positive resist composition, which can reduce cost steeply without significantly decreasing basic abilities, is provided, and the chemical amplification type positive resist composition includes (A) a resin having a polymerization unit derived from p-hydroxystyrene and a polymerization unit of the formula (1) or formula (2) which is insoluble or poorly soluble itself in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (B) a resin obtained by protecting a portion of the hydroxyl groups in poly(p-hydroxystyrene) with a protective group not dissociating by the action of an acid or a resin obtained by substituting a portion of the hydroxyl groups in poly(p-hydroxystyrene) with hydrogen, and (C) an acid generating agent.Type: GrantFiled: September 26, 2002Date of Patent: April 10, 2007Assignee: Sumitomo Chemical Company LimitedInventors: Airi Yamada, Masumi Suetsugu, Yasunori Uetani
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Patent number: 7160669Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: GrantFiled: October 10, 2003Date of Patent: January 9, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Patent number: 6828079Abstract: A chemical amplification type positive resist composition comprising a novolak resin, a resin insoluble or poorly soluble itself in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein when the novolak resin is measured by gel permeation chromatography (GPC) using a 254 nm UV detector using polystyrene as a standard, the area ratio of components having molecular weights of 1000 or less is 25% or less based on the total pattern area excepting unreacted monomers; and the chemical amplification type positive resist composition can reduce cost without deteriorating basic abilities such as sensitivity, resolution and the like, and shows small unevenness due to standing wave, and can improved pattern profile, particularly, line edge roughness.Type: GrantFiled: September 4, 2002Date of Patent: December 7, 2004Assignee: Sumitomo Chemical Company, LimitedInventors: Masumi Suetsugu, Airi Yamada, Yasunori Uetani
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Publication number: 20040138353Abstract: The present invention provides a sulfonium salt of the formula (Ia) 1Type: ApplicationFiled: October 10, 2003Publication date: July 15, 2004Inventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
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Patent number: 6689531Abstract: A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.Type: GrantFiled: August 27, 2002Date of Patent: February 10, 2004Assignees: Sumitomo Chemical Company, Limited, Dongwoo Fine-Chem Co., Ltd.Inventors: Sang Tae Kim, Seung Jin Kang, Shi Jin Sung, Masumi Suetsugu, Airi Yamada
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Publication number: 20030119957Abstract: A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): 1Type: ApplicationFiled: August 27, 2002Publication date: June 26, 2003Inventors: Sang Tae Kim, Seung Jin Kang, Shi Jin Sung, Masumi Suetsugu, Airi Yamada
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Publication number: 20030114589Abstract: A chemical amplification type positive resist composition comprising a novolak resin, a resin insoluble or poorly soluble itself in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein when the novolak resin is measured by gel permeation chromatography (GPC) using a 254 nm UV detector using polystyrene as a standard, the area ratio of components having molecular weights of 1000 or less is 25% or less based on the total pattern area excepting unreacted monomers; and the chemical amplification type positive resist composition can reduce cost without deteriorating basic abilities such as sensitivity, resolution and the like, and shows small unevenness due to standing wave, and can improved pattern profile, particularly, line edge roughness.Type: ApplicationFiled: September 4, 2002Publication date: June 19, 2003Inventors: Masumi Suetsugu, Airi Yamada, Yasunori Uetani
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Patent number: 6579659Abstract: A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent.Type: GrantFiled: April 3, 2001Date of Patent: June 17, 2003Inventors: Yasunori Uetani, Airi Yamada, Yoshiko Miya, Yoshiyuki Takata
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Publication number: 20030099900Abstract: A chemical amplification type positive resist composition, which can reduce cost steeply without significantly decreasing basic abilities, is provided, and the chemical amplification type positive resist composition comprises (A) a resin having a polymerization unit derived from p-hydroxystyrene and a polymerization unit of the formula (1) or formula (2) 1Type: ApplicationFiled: September 26, 2002Publication date: May 29, 2003Inventors: Airi Yamada, Masumi Suetsugu, Yasunori Uetani
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Patent number: 6569596Abstract: A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula (I): wherein R represents an unsubstituted or substituted alkyl, an alicyclic hydrocarbon residue, an aryl or a camphor group, and an acid generator other than the above N-substituted succinimide compound is provided.Type: GrantFiled: May 31, 2000Date of Patent: May 27, 2003Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Airi Yamada, Hiroki Inoue
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Publication number: 20010044070Abstract: A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent.Type: ApplicationFiled: April 3, 2001Publication date: November 22, 2001Inventors: Yasunori Uetani, Airi Yamada, Yoshiko Miya, Yoshiyuki Takata