Patents by Inventor Aiyang Wang

Aiyang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Refractory metal nickel electrodes for capacitors
    Patent number: 7277269
    Abstract: A capacitor with conductive layers arranged in parallel relationship. The conductive layers have nickel alloyed or add mixed with a refractory metal in an amount sufficient to raise the melting temperature of said conductive layer at least 1° C. above the melting temperature of nickel. A dielectric layers is between the conductive layers. Alternating layers of said conductive layers are in electrical contact with external terminations of opposing polarity.
    Type: Grant
    Filed: September 23, 2005
    Date of Patent: October 2, 2007
    Assignee: Kemet Electronics Corporation
    Inventors: Daniel E. Barber, Aiyang Wang, Michael S. Randall, Aziz Tajuddin
  • Refractory metal nickel electrodes for capacitors
    Publication number: 20060114640
    Abstract: A capacitor with conductive layers arranged in parallel relationship. The conductive layers have nickel alloyed or add mixed with a refractory metal in an amount sufficient to raise the melting temperature of said conductive layer at least 1° C. above the melting temperature of nickel. A dielectric layers is between the conductive layers. Alternating layers of said conductive layers are in electrical contact with external terminations of opposing polarity.
    Type: Application
    Filed: September 23, 2005
    Publication date: June 1, 2006
    Inventors: Daniel Barber, Aiyang Wang, Michael Randall, Aziz Tajuddin