Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: A privacy screen with rapid deploy, mount, and storage features. The privacy screen comprises a semi-rigid frame supporting a cover. The privacy screen is held in place with tension or friction against bed side rails. The privacy screen is portable, provides privacy to a patient, and allows patient access by a health care professional.

Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and wherein a rotational axis of the drum is vertical and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: A mobile computing device has an image capture device configured to scan a quick response code adhered to a medical linen. Further, the mobile computing device has a processor that generates a graphical user interface having a scanning menu, which lists one or more user selectable indicia. Each of the one or more user selectable indicia is selectable prior to the image capture device performing the scan of the quick response code. Furthermore, each of the one or more selectable indicia is associated with a computer-implemented instruction to update a database via a network. The database stores a data structure corresponding to the medical linen. The one or more selectable indicia are selected from the group consisting of: a medical linen installation indicium and a medical linen disposal indicium.

Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and wherein a rotational axis of the drum is vertical and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and wherein a rotational axis of the drum is vertical and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: A household cleaning appliance having a rotatable drum located within the interior and defining a treating chamber for receiving an article for treating and wherein a rotational axis of the drum is vertical and a method for operating the household cleaning appliance. The household cleaning appliance includes a dispensing system that includes and can be operated as a non-bulk dispensing system or as a bulk dispensing system in a household cleaning appliance.

Abstract: According to one exemplary embodiment, a method for increasing manufacturability of a circuit layer includes determining a threshold value for at least one image property from a repetitive section of the circuit layout. According to this embodiment, the method further includes performing a simulated lithographic process using the circuit layout to determine a number of simulated values of the at least one image property for a non-repetitive section of the circuit layout. The method further includes comparing each of the simulated values with the threshold value to determine printability of the non-repetitive section of the circuit layout prior to lithographically printing the circuit layout on a wafer. The method further includes modifying the non-repetitive section of the circuit layout if the threshold value is greater than at least one of the simulated values. By modifying the non-repetitive section of the circuit layout, manufacturability of the circuit layout can be increased.

Abstract: A semiconductor fabrication method that includes forming a film (109) comprising an imaging layer (112) and an under layer (110) over a semiconductor substrate (102). The imaging layer (112) is patterned to produce a printed feature (116) having a printed dimension (124). The under layer (110) is then processed to produce a sloped sidewall void (120) in the under layer (110) wherein the void (120) has a finished dimension (126) in proximity to the underlying substrate that is less than the printed dimension. Processing the under layer (110) may include exposing the wafer to high density low pressure N2 plasma.

Abstract: A semiconductor fabrication method that includes forming a film (109) comprising an imaging layer (112) and an under layer (110) over a semiconductor substrate (102). The imaging layer (112) is patterned to produce a printed feature (116) having a printed dimension (124). The under layer (110) is then processed to produce a sloped sidewall void (120) in the under layer (110) wherein the void (120) has a finished dimension (126) in proximity to the underlying substrate that is less than the printed dimension. Processing the under layer (110) may include exposing the wafer to high density low pressure N2 plasma.

Abstract: A method of forming tungsten silicide (WSix) films is provided. The tungsten silicide (WSix) film is formed by reacting a tungsten source with a silicon source. After the tungsten silicide (WSix) film is formed, it is spike annealed to reduce the resistivity of the as-deposited film. The spike annealed tungsten silicide (WSix) layer has a resistivity less than about 60 &mgr;&OHgr;-cm.

Abstract: A method and apparatus for accurately transforming coordinates within a first coordinate system (e.g., a two-dimensional coordinate system associated with a substrate (or portion thereof)) into coordinates in a second coordinate system (e.g., a three-dimensional coordinate system of substrate (or portion thereof) tilted within a wafer analysis tool.