Patents by Inventor Akane Sekiya

Akane Sekiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of removing photoresist film
    Patent number: 5681487
    Abstract: The present invention provides a method of removing a photoresist film, which exhibits the high ability to remove photoresist and excellent safety and handling properties such as workability, In the removing method, the photoresist film is removed by chemical decomposition in an inorganic aqueous solution under ultraviolet-light irradiation. The inorganic aqueous solution is an aqueous solution of peroxomonosulfate or an aqueous solution containing 4.5 to 36 wt % of sulfuric acid and 0.05 to 0.8 wt % of hydrogen peroxide.
    Type: Grant
    Filed: July 7, 1995
    Date of Patent: October 28, 1997
    Assignees: Frontec Incorporated, Tadahiro Ohmi
    Inventors: Hitoshi Seki, Chisato Iwasaki, Akane Sekiya, Yasuhiko Kasama, Tadahiro Ohmi