Patents by Inventor Ake Hjalmarsson

Ake Hjalmarsson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma activated chemical vapour deposition method and apparatus therefor
    Patent number: 8883246
    Abstract: In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: November 11, 2014
    Assignee: Plasmatrix Materials AB
    Inventors: Mihai Nicolescu, Äke Hjalmarsson, Klim Kouznetsov
  • Plasma Activated Chemical Vapour Deposition Method and Apparatus Therefor
    Publication number: 20110081477
    Abstract: In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode.
    Type: Application
    Filed: December 12, 2008
    Publication date: April 7, 2011
    Applicant: PLASMATRIX MATERIALS AB
    Inventors: Mihai Nicolescu, Äke Hjalmarsson, Vladimir Kouznetsov, Klim Kouznetsov
  • Holder for accurate positioning of a workpiece
    Patent number: 6811150
    Abstract: A holder for accurate positioning of a workpiece in the working area of a machine tool, especially an erosion machine, which includes a vibration damper to make the holder insensitive to vibrations such as those caused by variable rinse fluid pressure while machining the workpiece. At least one of the holder and workpiece is provided with a vibration damper.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: November 2, 2004
    Assignee: System 3R International AB
    Inventors: Hakon Nordquist, Ake Hjalmarsson
  • Holder for accurate positioning of a workpiece
    Publication number: 20010005066
    Abstract: A holder for accurate positioning of a workpiece in the working area of a machine tool, especially an erosion machine, which includes a vibration damper to make the holder insensitive to vibrations such as those caused by variable rinse fluid pressure while machining the workpiece. At least one of the holder and workpiece is provided with a vibration damper.
    Type: Application
    Filed: February 9, 2001
    Publication date: June 28, 2001
    Inventors: Hakon Nordquist, Ake Hjalmarsson