Patents by Inventor Akhil Devarakonda

Akhil Devarakonda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240116283
    Abstract: Embodiments provide for the manipulation of fabric items using a roller. A fabric item is engaged by a roller. Rotation of the roller while traversing the roller across the fabric item progressively lifts the fabric item onto the roller. In an example, the fabric item is held on the roller by applying a vacuum via the roller. In an example the roller is used to deposit one portion of the fabric item onto another portion of the fabric item in a joining process. In an example, the roller is used to deposit the fabric item onto another fabric item in a joining process.
    Type: Application
    Filed: October 9, 2023
    Publication date: April 11, 2024
    Inventors: Thomas FEIX, Hossein Mousavi HONDORI, Gaston Justice MACMILLAN, Martin Frederick BAMBERGER, Nicholas CHOPE, Michael CORLISS, Sean Magnus BECKER, Michael William TANGUAY, Akhil DEVARAKONDA
  • Publication number: 20190304756
    Abstract: Systems and methods may be used to produce coated components. Exemplary chamber components may include an aluminum, stainless steel, or nickel plate defining a plurality of apertures. The plate may include a hybrid coating, and the hybrid coating may include a first layer comprising a corrosion resistant coating. The first layer may extend conformally through each aperture of the plurality of apertures. The hybrid coating may also include a second layer comprising an erosion resistant coating extending across a plasma-facing surface of the semiconductor chamber component.
    Type: Application
    Filed: April 3, 2019
    Publication date: October 3, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Laksheswar Kalita, Soonam Park, Toan Q. Tran, Lili Ji, Dmitry Lubomirsky, Akhil Devarakonda, Tien Fak Tan, Tae Won Kim, Saravjeet Singh, Alexander Tam, Jingchun Zhang, Jing J. Zhang
  • Publication number: 20190119815
    Abstract: Systems and methods may be used to enact plasma filtering. Exemplary processing chambers may include a showerhead. The processing chambers may include a substrate support. The processing chambers may include a power source electrically coupled with the substrate support and configured to provide power to the substrate support to produce a bias plasma within a processing region defined between the showerhead and the substrate support. The processing systems may include a plasma screen coupled with the substrate support and configured to substantially eliminate plasma leakage through the plasma screen. The plasma screen may be coupled with electrical ground.
    Type: Application
    Filed: October 22, 2018
    Publication date: April 25, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Soonam Park, Toan Q. Tran, Nikolai Kalnin, Dmitry Lubomirsky, Akhil Devarakonda