Abstract: A method of eliminating an occurrence of concentration differences in a developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse, preventing occurrence of stain-like defects on a resist film surface, and reducing amount of the developer used is disclosed. While a substrate is being rotated about a vertical axis by a rotation motor while held in a horizontal posture by a spin chuck, after the developer has been fed onto the resist film on the substrate surface from a developer discharge nozzle to conduct processing, the substrate continues to be rotated and thus the developer on the resist film is dispersed and removed by a centrifugal force, and when an interference fringe seen on the substrate surface is reduced in level or not present, a rinse is fed onto the resist film from a rinse discharge nozzle to conduct rinsing.

Abstract: The invention provides a method capable of eliminating occurrence of concentration difference in developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse; preventing occurrence of stain-like defects on a resist film surface; and reducing amount used of the developer. While a substrate is being rotated about a vertical axis by a rotation motor with held in a horizontal posture by a spin chuck, after the developer has been fed onto the resist film on the substrate surface from a developer discharge nozzle to conduct processing, the substrate continues to be rotated and thus the developer on the resist film is dispersed by a centrifugal force to be removed, and thereafter a rinse is fed onto the resist film from a rinse discharge nozzle to conduct rinsing.