Patents by Inventor Aki Nakajo

Aki Nakajo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7234998
    Abstract: Setting a polishing rate and a polishing time in chemical mechanical polishing can be performed with high accuracy by considering a product wafer of an object to be polished, and an instrumental error between apparatuses to be used, etc. By using, as a calculating formula, a formula well approximating a portion of a curve representing a state of chemical mechanical polishing on a side showing a target polishing amount, the polishing rate and the polishing time can be set with high accuracy according to a state of chemical mechanical polishing for actually polishing a product wafer. In the calculating formula, a parameter “A” relating to a film property of a film of an object to be polished, a parameter “B” relating to a roughness state of a film surface, and a parameter “C” relating to an instrumental error differential between apparatuses of a chemical mechanical polishing apparatus are joined by operators.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: June 26, 2007
    Assignee: Trecenti Technologies, Inc.
    Inventors: Masahiro Aoyagi, Aki Nakajo, Hirofumi Tsuchiyama, Shinobu Nakamura
  • Publication number: 20050197046
    Abstract: Setting a polishing rate and a polishing time in chemical mechanical polishing can be performed with high accuracy by considering a product wafer of an object to be polished, and an instrumental error between apparatuses to be used, etc. By using, as a calculating formula, a formula well approximating a portion of a curve representing a state of chemical mechanical polishing on a side showing a target polishing amount, the polishing rate and the polishing time can be set with high accuracy according to a state of chemical mechanical polishing for actually polishing a product wafer. In the calculating formula, a parameter “A” relating to a film property of a film of an object to be polished, a parameter “B” relating to a roughness state of a film surface, and a parameter “C” relating to an instrumental error differential between apparatuses of a chemical mechanical polishing apparatus are joined by operators.
    Type: Application
    Filed: February 24, 2005
    Publication date: September 8, 2005
    Inventors: Masahiro Aoyagi, Aki Nakajo, Hirofumi Tsuchiyama, Shinobu Nakamura
  • Patent number: 6665123
    Abstract: In a projector, the precision of color synthesis is improved and the generation of vertical stripes in the projected image is suppressed by a dichroic prism used for color synthesis that employs at least the following aspects. (1) The dichroic prism is formed using triangular prisms, in which projections or grooves are provided that have two faces parallel to two pasted faces of the triangular prisms, the projections or grooves being integrally injection-molded on faces of the triangular prisms that are substantially perpendicular to the light beam (i.e., the faces through which no light beam passes); (2) the dichroic prism is positioned using marks on the pasted faces of the triangular prisms; or (3) the dichroic prism is formed by engaging triangular prisms in which recesses or projections are formed.
    Type: Grant
    Filed: May 21, 2002
    Date of Patent: December 16, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Aki Nakajo, Makoto Iida, Hiroki Kuramoto, Masakazu Ogawa, Tatsumi Hasebe, Yoshie Kodera, Sadayauki Nishimura
  • Publication number: 20020171938
    Abstract: The present invention improves the precision of color synthesis and suppresses the generation of vertical stripes in the projected image, and includes at least the following three aspects.
    Type: Application
    Filed: May 21, 2002
    Publication date: November 21, 2002
    Inventors: Aki Nakajo, Makoto Iida, Hiroki Kuramoto, Masakazu Ogawa, Tatsumi Hasebe, Yoshie Kodera, Sadayuki Nishimura