Patents by Inventor Akihiko Hidaka

Akihiko Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7288762
    Abstract: The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: October 30, 2007
    Assignee: SII NanoTechnology Inc.
    Inventors: Masato Iyoki, Akihiko Hidaka, Kazutoshi Watanabe
  • Publication number: 20050231066
    Abstract: The invention provides a fine-adjustment mechanism for a scanning probe microscopy with high rigidity and high degree of measurement accuracy wherein a strain gauge displacement sensor which can be installed in a small space is arranged so that temperature compensation is achieved. The fine-adjustment mechanism composed of a piezoelectric device is provided with at least two-piece electrode. One of the electrodes is configured as a dummy electrode, to which no voltage is applied, and the other electrode is configured as an active electrode which generates strain when voltage is applied. One or two resistors are provided on each of the active electrode and dummy electrode, and a bridge circuit is configured by the resistors.
    Type: Application
    Filed: January 28, 2005
    Publication date: October 20, 2005
    Inventors: Masato Iyoki, Akihiko Hidaka, Kazutoshi Watanabe
  • Patent number: 5656088
    Abstract: For processing semiconductor substrates in a processing fluid, the substrates are introduced into a processing bath in which the processing fluid is filled. For holding the substrates in the process of introducing them into the processing bath, a holder having a pair of holding rods end a pair of aiding rods is prepared. A periodical linear array of grooves is formed on each rod. The rims of substrates are inserted into respective corresponding grooves on the rods so that the substrates do not touch respective side walls of the grooves in the aiding rod.
    Type: Grant
    Filed: August 26, 1992
    Date of Patent: August 12, 1997
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Kenji Sugimoto, Tadashi Maegawa, Akihiko Hidaka, Toshio Hiroe, Hideki Hayashi
  • Patent number: 5466066
    Abstract: In a thermogravimetric apparatus which is composed of a balance-arm 1, a detector 2 for detecting an amount of deviation of the balance-arm 1, a control circuit 3 for controlling equilibrium of the balance, and a driving part 6 for moving the balance-arm to the balanced position, vibration of the balance-arm has been made possible by adding a vibration generating circuit 5 for vibrating the balance-arm 1 and an adding circuit 4 for adding a signal from the control circuit 3 to a signal from the vibration generating circuit 5. A measurement which is excellent in reproducibility and accuracy is thus obtained. Automation of replacement of samples and unattended measurement are also made possible.
    Type: Grant
    Filed: January 21, 1994
    Date of Patent: November 14, 1995
    Assignee: Seiko Instruments Inc.
    Inventor: Akihiko Hidaka