Abstract: Accurate and sensitive sequencing in pyrosequencing is achieved by allowing complementary strand synthesis reaction to proceed homogeneously and completely in a short time while performing luminescence reaction for a sufficiently long time. DNA as a sequencing target is immobilized on the surface of a solid support. Nucleic acid substrates are injected from a dispenser to the support site where complementary strand synthesis is in turn performed rapidly and completely in a short time under a small reaction volume. Next, the support together with the product thereon is moved into a luminescence reaction solution where luminescence reaction is in turn performed. Thus, a DNA complementary strand synthesis reaction site and a luminescence reaction site are completely separated. The support surface is also washed by dipping the support in the luminescence reaction solution that contains a luminescence reagent and an enzyme that degrades redundant nucleic acid substrates.

Abstract: Accurate and sensitive sequencing in pyrosequencing is achieved by allowing complementary strand synthesis reaction to proceed homogeneously and completely in a short time while performing luminescence reaction for a sufficiently long time. DNA as a sequencing target is immobilized on the surface of a solid supporter. Nucleic acid substrates are injected from a dispenser to the supporter site where complementary strand synthesis is in turn performed rapidly and completely in a short time under a small reaction volume. Next, the supporter together with the product thereon is moved into a luminescence reaction solution where luminescence reaction is in turn performed. Thus, a DNA complementary strand synthesis reaction site and a luminescence reaction site are completely separated. The-supporter surface is also washed by dipping the supporter in the luminescence reaction solution that contains a luminescence reagent and an enzyme that degrades redundant nucleic acid substrates.

Abstract: The present invention provides an inexpensive DNA sequencing method with high-sensitivity. The method of the present invention comprising the steps of, adding an given amount of dATP for step by step complementary strand synthesis and subtracting the background luminescence intensity caused by dATP from the measured luminescence intensity to obtain the luminescence intensity involved in complementary strand synthesis.

Abstract: Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.

Abstract: Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, area permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.

Abstract: Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.

Abstract: Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.

Abstract: A mask for exposing a wafer with radiation and its exposition method in which the radiation exposure mask is provided with at least two radiation exposure windows which each include a mask pattern of a smaller pattern area obtained by dividing a pattern area constituting an integrating circuit chip into a plurality of the areas, and a semiconductor wafer is exposed with radiation while the radiation exposure mask is intermittently moved by a distance of the size of the small pattern area.

Abstract: A polyphenylene sulfide resin composition having excellent impact properties is provided which comprises:(A) a polyphenylene sulfide resin and(B) an olefinic copolymer containing 60 to 99.5% by weight of an .alpha.-olefin and 0.5 to 40% by weight of a glycidyl ester of an .alpha.,.beta.-unsaturated carboxylic acid,and which is characterized in that the polyphenylene sulfide resin (A) is contacted to improve its affinity with the olefinic copolymer (B).

Abstract: An antistatic resinours composition comprising (A) graft copolymers prepared by emulsion polymerization of (a) monomer mixture consisting of (i) from 50 to 100 percents by weight of monomers having polyalkylene oxide chains and (ii) from 50 to 0 percents by weight of vinyl monomers in the presence of rubbers and (B) thermoplastic resins compatible with the graft copolymers, has permanent antistatic performances, superior mechanical properties and high flowability.

Abstract: A method is provided for continuously manufacturing high impact strength thermoplastic resins comprised of the sequential steps of (a) bulk-polymerizing a monomer solution, which contains a diene type rubber polymer or a graft polymer obtained by extracting the rubber polymer particle or vinyl monomer grafted polymer particle in latex with vinyl monomers which contain 5-20 percent by weight of water at a temperature of 85.degree.-135.degree.C, while continuously stirring the solution, vaporizing the volatile components, condensing the volatile component and recycling them back to reaction mixture, until the solid content in the reaction mixture reaches 40-75 percent by weight, and thereafter (b) bulk polymerizing the resulting prepolymer solution under the condition that plug-flowing can be attained with a temperature gradient 100.degree.-170.degree.C at the top of the reaction vessel and 170.degree.-270.degree.

Abstract: High impact resistant thermoplastic resins are produced in three steps: (a) graft polymerizing a minor amount of unsaturated monomer onto a major amount of diene type rubber polymer in latex form, (b) mixing the grafted diene type rubber latex with a monomer or monomers, extracting the grafted rubber polymer particles into the monomer phase and separating and discarding the water phase to obtain a grafted rubber polymer particle dispersed monomer solution, and (c) bulk polymerizing the resulting rubber polymer particle dispersed monomer solution.