Patents by Inventor Akihiko Kizaki
Akihiko Kizaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7348555Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.Type: GrantFiled: January 4, 2005Date of Patent: March 25, 2008Assignee: TDK CorporationInventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Hiroshi Tominaga, Akihiko Kizaki, Kunihiko Ozaki
-
Patent number: 7282726Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.Type: GrantFiled: January 4, 2005Date of Patent: October 16, 2007Assignee: TDK CorporationInventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Akihiko Kizaki, Hiroshi Tominaga, Kunihiko Ozaki
-
Publication number: 20050191439Abstract: A coating material of an electron beam curable type is printed or coated onto a substrate of a heat shrinkable plastic film. Then, the coating material is cured by electron beam irradiation to form a coating layer. As a consequence, a shrinkable film including the substrate and the coating layer disposed thereon is obtained.Type: ApplicationFiled: June 3, 2003Publication date: September 1, 2005Applicants: TOYO INK MFG. CO., LTD., MATSUI CHEMICAL CO., LTD.Inventors: Takeshi Hirose, Akihiko Kizaki, Keiichi Sato, Kei Oizumi, Sanji Harada, Masataka Nanba
-
Publication number: 20050180877Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.Type: ApplicationFiled: January 4, 2005Publication date: August 18, 2005Applicants: Toyo Ink Mfg., Co., Ltd., TDK CorporationInventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Akihiko Kizaki, Hiroshi Tominaga, Kunihiko Ozaki
-
Patent number: 6930315Abstract: A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y?1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.Type: GrantFiled: March 5, 2004Date of Patent: August 16, 2005Assignee: Toyo Ink Manufacturing Co., Ltd.Inventors: Hiroshi Tominaga, Akihiko Kizaki
-
Publication number: 20050173654Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.Type: ApplicationFiled: January 4, 2005Publication date: August 11, 2005Applicants: Toyo Ink Manufacturing Co., Ltd., TDK CorporationInventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Hiroshi Tominaga, Akihiko Kizaki, Kunihiko Ozaki
-
Publication number: 20050163024Abstract: An optical disc includes a substrate provided with information recorded portions formed therein, and a plurality of layers further disposed on the substrate, wherein at least one of the plurality of layers is a layer cured and formed by electron beam irradiation.Type: ApplicationFiled: June 3, 2003Publication date: July 28, 2005Applicant: Toyo Ink Manufacturing Co., Ltd.Inventors: Keiichi Sato, Michio Terayama, Akihiko Kizaki, Takeshi Hirose
-
Publication number: 20040178363Abstract: A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y≧1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.Type: ApplicationFiled: March 5, 2004Publication date: September 16, 2004Applicant: TOYO INK MANUFACTURING CO., LTD.Inventors: Hiroshi Tominaga, Akihiko Kizaki, Yasuo Iida, Kunihiko Ozaki
-
Patent number: 6727508Abstract: A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y≧1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.Type: GrantFiled: June 4, 2001Date of Patent: April 27, 2004Assignee: Toyo Ink Manufacturing Co., Ltd.Inventors: Hiroshi Tominaga, Akihiko Kizaki, Yasuo Iida, Kunihiko Ozaki