Patents by Inventor Akihiko Yokoyama

Akihiko Yokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11325921
    Abstract: The present invention relates to the compound of formula (I) wherein p is 1 or 2, R1 is —CF3 or the like, R2a, R2b, R3a, and R3b are hydrogen atom or the like, X is —C(?O)—or the like, or a pharmaceutically acceptable salt thereof, which has an antitumor effect by inhibiting the binding between a MLL fusion protein that is infused with AF4, AF9, or the like, which is a representative fusion partner gene causing MLL leukemia, and menin.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: May 10, 2022
    Assignee: Sumitomo Dainippon Pharma Co., Ltd.
    Inventors: Seiji Kamioka, Naoaki Shimada, Wataru Hirose, Hitoshi Ban, Akihiko Yokoyama
  • Publication number: 20210024547
    Abstract: The present invention relates to the compound of formula (I) wherein p is 1 or 2, R1 is —CF3 or the like, R2a, R2b, R3a, and R3b are hydrogen atom or the like, X is —C(?O)—or the like, or a pharmaceutically acceptable salt thereof, which has an antitumor effect by inhibiting the binding between a MLL fusion protein that is infused with AF4, AF9, or the like, which is a representative fusion partner gene causing MLL leukemia, and menin.
    Type: Application
    Filed: March 29, 2019
    Publication date: January 28, 2021
    Applicant: Sumitomo Dainippon Pharma Co., Ltd.
    Inventors: Seiji KAMIOKA, Naoaki SHIMADA, Wataru HIROSE, Hitoshi BAN, Akihiko YOKOYAMA
  • Patent number: 10900014
    Abstract: [Problem] To provide a medium suitable for long-term storage, i.e., that ensures sufficient quality retention period, for growing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and to provide a method of easily detecting obligate anaerobic bacteria or microaerobic bacteria using said medium. [Means for solving the problem] A long-term storage medium comprising dithiothreitol and/or ascorbic acid as a reducing agent in a basal medium, for culturing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and a method of detecting obligate anaerobic bacteria or microaerobic bacteria using said medium.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: January 26, 2021
    Assignee: Kanto Kagaku Kabushiki Kaisha
    Inventors: Norikuni Uchida, Akihiko Yokoyama
  • Publication number: 20170175074
    Abstract: [Problem] To provide a medium suitable for long-term storage, i.e., that ensures sufficient quality retention period, for growing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and to provide a method of easily detecting obligate anaerobic bacteria or microaerobic bacteria using said medium. [Means for solving the problem] A long-term storage medium comprising dithiothreitol and/or ascorbic acid as a reducing agent in a basal medium, for culturing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and a method of detecting obligate anaerobic bacteria or microaerobic bacteria using said medium.
    Type: Application
    Filed: December 16, 2016
    Publication date: June 22, 2017
    Applicant: Kanto Kagaku Kabushiki Kaisha
    Inventors: Norikuni Uchida, Akihiko Yokoyama
  • Patent number: 5858450
    Abstract: In formation of thin films on both surfaces of a substrate such as a lens or the like, a pair of cluster beam evaporation sources are provided in mutually separate manner in a film forming chamber. The substrate is disposed between the pair of cluster beam evaporation sources. The cluster beam evaporation source includes a crucible which is arranged to be inclined toward the substrate, or which has a nozzle on a lateral face opposed to the substrate.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: January 12, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidehiko Fujimura, Mitsuharu Sawamura, Makoto Kameyama, Akihiko Yokoyama
  • Patent number: 5582879
    Abstract: In a method of manufacturing a thin film, evaporated particles are generated by a vapor source and are clustered. The clustered evaporated particles are deposited onto a substrate in a vacuum atmosphere without ionizing the particles. A partial pressure of water in the vacuum atmoshpere is controlled to not more than 5.times.10.sup.-6 Torr. A temperature of the substrate is maintained to be 150.degree. C. or lower. A film according to this method has a high adhesion characteristics and a high mechanical strength without heating the substrate to a high temperature and without damaging the substrate by ions.
    Type: Grant
    Filed: November 4, 1994
    Date of Patent: December 10, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidehiko Fujimura, Mitsuharu Sawamura, Makoto Kameyama, Akihiko Yokoyama
  • Patent number: 5532871
    Abstract: A two-wavelength antireflection film includes a substrate and an alternate film. The alternate film consists of alternately laminated layers of a low refractive index material and an intermediate refractive index material, in order from a light entrance side to the surface of the substrate. The low refractive index material is at least a member selected from the group consisting of MgF.sub.2, SiO.sub.2, BaF.sub.2, LiF, SrF.sub.2, AlF.sub.3, NaF, a mixture thereof and a compound thereof. The intermediate refractive index material is at least a member selected from the group consisting of Al.sub.2 O.sub.3, LaF.sub.3, NdF.sub.3, YF.sub.3, a mixture thereof and a compound thereof.
    Type: Grant
    Filed: November 24, 1993
    Date of Patent: July 2, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigeru Hashimoto, Akihiko Yokoyama
  • Patent number: 5460888
    Abstract: Alternating films consisting of alternations of high refractive index films and low refractive index films are provided on a transparent substrate such that the high refractive index film is adjacent to the substrate. The low refractive index films are composed of Al.sub.2 O.sub.3. The high refractive index films are composed of at least a component selected from a group consisting of TiO.sub.2, Ta.sub.2 O.sub.5, HfO.sub.2, ZrO.sub.2, Nb.sub.2 O.sub.5, mixture thereof and modified substances thereof.
    Type: Grant
    Filed: September 16, 1994
    Date of Patent: October 24, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventors: Sigeru Hashimoto, Akihiko Yokoyama