Abstract: There is disclosed a photocatalyst which comprises a substrate having a photocatalytic function and metallic nanocolloid particles that are supported on the substrate by the use of a metallic nanocolloid liquid substantially free from a protective colloid formation agent. A highly active photocatalyst containing metallic ultrafine particles is provided by bringing a substrate such as fine particles having a photocatalytic function into contact with a metallic nanocolloid liquid which is substantially free from a protective colloid formation agent, and which has favorable dispersion stability even if containing metallic nanocolloid particles in a relatively high concentration. Accordingly the photocatalyst containing metallic ultrafine particles can be produced at a low cost without being restricted on the place of production.

Abstract: A heat-resistant pipe is arranged so as to traverse below a glass ribbon in a float bath of molten tin, and bubbles emanate from the heat-resistant pipe, thereby making the bottom surface (which is in contact with the tin) uneven. Alternatively, the bottom surface is made uneven with a roller for lifting the glass ribbon out of the float bath into an annealing furnace. In addition to these operations for making the glass surface uneven, a film can be applied to the top face of the glass ribbon (i.e. the surface that is not in contact with the tin) by CVD, supplying a mixed gas of raw material from coaters. Thus, the invention makes it possible to manufacture a glass sheet having an uneven surface efficiently, using a technique for processing the surface of a glass sheet that is suitable for a production line for float glass.

Abstract: A heat-resistant pipe is arranged so as to traverse below a glass ribbon in a float bath of molten tin, and bubbles emanate from the heat-resistant pipe, thereby making the bottom surface (which is in contact with the tin) uneven. Alternatively, the bottom surface is made uneven with a roller for lifting the glass ribbon out of the float bath into an annealing furnace. In addition to these operations for making the glass surface uneven, a film can be applied to the top face of the glass ribbon (i.e. the surface that is not in contact with the tin) by CVD, supplying a mixed gas of raw material from coaters. Thus, the invention makes it possible to manufacture a glass sheet having an uneven surface efficiently, using a technique for processing the surface of a glass sheet that is suitable for a production line for float glass.

Abstract: A heat-resistant pipe is arranged so as to traverse below a glass ribbon in a float bath of molten tin, and bubbles emanate from the heat-resistant pipe, thereby making the bottom surface (which is in contact with the tin) uneven. Alternatively, the bottom surface is made uneven with a roller for lifting the glass ribbon out of the float bath into an annealing furnace. In addition to these operations for making the glass surface uneven, a film can be applied to the top face of the glass ribbon (i.e. the surface that is not in contact with the tin) by CVD, supplying a mixed gas of raw material from coaters. Thus, the invention makes it possible to manufacture a glass sheet having an uneven surface efficiently, using a technique for processing the surface of a glass sheet that is suitable for a production line for float glass.

Abstract: A window glass for an automobile and the window structure capable of clearly indicating visually warning by a high mounted stop lamp, etc., while having a heat-shielding function and a privacy protecting function are provided. A heat-shielding film is formed on the concave side (inside the automobile) of the window glass for an automobile, the film is partially removed or modified, and the visible light transmission of the removed or modified portion is increased to a predetermined value than the visible light transmission of other film-formed portion.

Abstract: A method for producing a silicon dioxide film by contacting a substrate such as glass with a treating liquid comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide to deposit a silicon dioxide film on the surface of the substrate, the method being characterized by providing a device for preventing an Si component from escaping from the treating liquid. According to the method, pollution of working environment and decrease in concentration of solution do not occur during the formation of silicon dioxide film.

Abstract: A process for forming a silica film on a substrate which comprises bringing the substrate into contact with an aqueous solution of hydrosilicofluoric acid supersaturated with silica, wherein the supersaturated solution is filled in an inner vessel which is opened downwardly so as to allow the introduction of the substrate thereinto and is arranged inside an outer vessel at a distance from the side walls and the bottom of the outer vessel, and a liquid material having substantially no reactivity and miscibility with the supersaturated solution and having a higher specific gravity than the supersaturated solution is charged in the outer vessel so as to retain the supersaturated solution in the inner vessel without flowing down toward the bottom of the outer vessel, and whereby the supersaturated solution is prevented from being exposed to the atmosphere and accordingly the process can be practiced at high deposition rate in high efficiency and yield without evaporating effective Si components which result in fo

Abstract: A process for depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by heating a hydrosilicofluoric acid solution substantially saturated with silicon dioxide which has a temperature of not more than 0.degree. C., to a temperature of not less than 25.degree. C.

Abstract: A film of the oxide of a metal selected from the group consisting of Sn, Zr, In, V, Cr, Mn, Fe, Co, Ni, and Cu is deposited on the surface of a substrate by a method which comprises establishing contact between the substrate and a treating liquid containing fluorine and the metal selected as described above thereby having the oxide of the metal dissolved to supersaturation therein.