Abstract: A method for producing a plasma display panel wherein the projection of the end portions of electrode in the widthwise direction are suppressed so that failure in insulation and pressure proof is not caused upon forming an electrode pattern by collectively exposing and developing a bus electrode having a two-layered structure. When the electrode pattern having two-layered structure by a photolithography method using a mask, exposure is made by applying light, while a part of a surface of portion of a paste film of an electrode material which portion to be formed into the electrode pattern is shield from the light, so that a dent is formed in the electrode surface after developing and the thermal shrinkage of the center portion and the thermal shrinkage of the end portions of the electrode in the widthwise direction are controlled separately by the dent.

Abstract: The die as provided is a die in which an upper block is placed on an upper surface of a lower block with a lower surface of the upper block in contact with the upper surface, wherein the lower block includes a manifold and a slit serving as a path for discharging paint from the manifold to the outside, constituted respectively from between the lower block and the lower surface of the upper block by forming a cavity and a space which communicates with the outside from this cavity along a columnar direction, respectively, from one end face of a columnar body with a trapezoidal shape of cross section to the other end face, a paint supply path which communicates with the manifold is formed from an outer side located between the one end face and the other end face of the lower block, a slit space dimension of the slit between front end portions in a paint discharge direction of the lower block and the upper block in a discharge port serving as an open end to the outside is smallest on the one end face side and inc

Abstract: A method for producing a plasma display panel wherein the projection of the end portions of electrode in the widthwise direction are suppressed so that failure in insulation and pressure proof is not caused upon forming an electrode pattern by collectively exposing and developing a bus electrode having a two-layered structure. When the electrode pattern having two-layered structure by a photolithography method using a mask, exposure is made by applying light, while a part of a surface of portion of a paste film of an electrode material which portion to be formed into the electrode pattern is shield from the light, so that a dent is formed in the electrode surface after developing and the thermal shrinkage of the center portion and the thermal shrinkage of the end portions of the electrode in the widthwise direction are controlled separately by the dent.

Abstract: The die as provided is a die in which an upper block is placed on an upper surface of a lower block with a lower surface of the upper block in contact with the upper surface, wherein the lower block includes a manifold and a slit serving as a path for discharging paint from the manifold to the outside, constituted respectively from between the lower block and the lower surface of the upper block by forming a cavity and a space which communicates with the outside from this cavity along a columnar direction, respectively, from one end face of a columnar body with a trapezoidal shape of cross section to the other end face, a paint supply path which communicates with the manifold is formed from an outer side located between the one end face and the other end face of the lower block, a slit space dimension of the slit between front end portions in a paint discharge direction of the lower block and the upper block in a discharge port serving as an open end to the outside is smallest on the one end face side and inc

Abstract: It is an object of the present invention to present a method for producing an electron tube capable of preventing agglomeration of particles contained in coating material to be coated on an shadow mask to form an electron beam reflecting film, that causes settling of the particles on a shadow mask or clogging of the coating system, and fluctuations of pressure for supplying the coating material to a spray nozzle, that cause unstable quantity by weight of the coating material discharged from the nozzle and excessive coating, thereby preventing deterioration of the quality of images. An electron beam reflecting film of high surface coverage can be formed for the electron tube with a small quantity by weight of the coating material containing bismuth oxide particles which have an average particle diameter D50 of 0.6 &mgr;m or less and a particle size distribution with the particles having a diameter between D40 and D60 accounting for at least 20% by volume of the total particles.

Abstract: The present invention has an object to provide a method of manufacturing an electronic tube capable of eliminating deterioration of image quality due to an excessively high electron reflection effect of a material comprising a metal element with an atomic number not lower than 70 and painted on a shadow mask and deterioration of image quality due to spontaneous peeling of a coat on the surface of the shadow mask. A paint mainly comprising a solated metal oxide or a metal alkoxide of an element with an atomic number not lower than 40 is painted to form an electron reflection coat with an amount of coating of less than 2 mg/cm2 so as to achieve coating on an electron gun side surface of a shadow mask. With this method, an electronic tube with good image quality can be manufactured.

Abstract: It is an object of the present invention to present a method for producing an electron tube capable of preventing agglomeration of particles contained in coating material to be coated on an shadow mask to form an electron beam reflecting film, that causes settling of the particles on a shadow mask or clogging of the coating system, and fluctuations of pressure for supplying the coating material to a spray nozzle, that cause unstable quantity by weight of the coating material discharged from the nozzle and excessive coating, thereby preventing deterioration of the quality of images. An electron beam reflecting film of high surface coverage can be formed for the electron tube with a small quantity by weight of the coating material containing bismuth oxide particles which have an average particle diameter D50 of 0.6 &mgr;m or less and a particle size distribution with the particles having a diameter between D40 and D60 accounting for at least 20% by volume of the total particles.

Abstract: It is an object of the present invention to present a method for producing an electron tube capable of preventing agglomeration of particles contained in coating material to be coated on an shadow mask to form an electron beam reflecting film, that causes settling of the particles on a shadow mask or clogging of the coating system, and fluctuations of pressure for supplying the coating material to a spray nozzle, that cause unstable quantity by weight of the coating material discharged from the nozzle and excessive coating, thereby preventing deterioration of the quality of images. An electron beam reflecting film of high surface coverage can be formed for the electron tube with a small quantity by weight of the coating material containing bismuth oxide particles which have an average particle diameter D50 of 0.6 &mgr;m or less and a particle size distribution with the particles having a diameter between D40 and D60 accounting for at least 20% by volume of the total particles.

Abstract: The present invention has an object to provide a method of manufacturing an electronic tube capable of eliminating deterioration of image quality due to an excessively high electron reflection effect of a material comprising a metal element with an atomic number not lower than 70 and painted on a shadow mask and deterioration of image quality due to spontaneous peeling of a coat on the surface of the shadow mask. A paint mainly comprising a solated metal oxide or a metal alkoxide of an element with an atomic number not lower than 40 is painted to form an electron reflection coat with an amount of coating of less than 2 mg/cm2 so as to achieve coating on an electron gun side surface of a shadow mask.