Abstract: The X-ray reflectometer of the present invention includes: an irradiation angle variable unit (10) configured to vary an irradiation angle of a focused X-ray beam (6) with a sample surface (8a); a position sensitive detector (14) which is fixed; and a reflection intensity calculation unit (15) configured to, per reflection angle of reflected X-rays (13) constituting a reflected X-ray beam (12), integrate a detected intensity by a corresponding detection element (11), for only the detection elements (11) positioned within a divergence angle width of the reflected X-ray beam (12) in the position sensitive detector (14), in synchronization of variation in the irradiation angle (?) of the focused X-ray beam (6) by the irradiation angle variable unit (10).

Abstract: The X-ray reflectometer of the present invention includes: an irradiation angle variable unit (10) configured to vary an irradiation angle of a focused X-ray beam (6) with a sample surface (8a); a position sensitive detector (14) which is fixed; and a reflection intensity calculation unit (15) configured to, per reflection angle of reflected X-rays (13) constituting a reflected X-ray beam (12), integrate a detected intensity by a corresponding detection element (11), for only the detection elements (11) positioned within a divergence angle width of the reflected X-ray beam (12) in the position sensitive detector (14), in synchronization of variation in the irradiation angle (?) of the focused X-ray beam (6) by the irradiation angle variable unit (10).

Abstract: An X-ray analyzing apparatus is such that a diffraction pattern, in which the intensity of secondary X-rays (4) is associated with the angle of rotation of a sample (S), is stored; while the pattern is scanned by a line of the secondary X-rays (4) intensity in a direction of highness and lowness, points on the pattern having not higher intensity than the line are taken as candidate points; respective angles of rotation of the candidate points, when the maximum value of the difference in angle of rotation between the neighboring candidate points attains a predetermined angle, are stored; depending on coordinates of a point of measurement, the angle of rotation proximate to the coordinates is read out from the stored angles; and the sample (S) is set to the read out angle and the point of measurement is arranged within the field of view (V) of a detector (7).

Abstract: An X-ray analyzing apparatus is such that a diffraction pattern, in which the intensity of secondary X-rays (4) is associated with the angle of rotation of a sample (S), is stored; while the pattern is scanned by a line of the secondary X-rays (4) intensity in a direction of highness and lowness, points on the pattern having not higher intensity than the line are taken as candidate points; respective angles of rotation of the candidate points, when the maximum value of the difference in angle of rotation between the neighboring candidate points attains a predetermined angle, are stored; depending on coordinates of a point of measurement, the angle of rotation proximate to the coordinates is read out from the stored angles; and the sample (S) is set to the read out angle and the point of measurement is arranged within the field of view (V) of a detector (7).

Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.

Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.

Abstract: An X-ray spectroscopic analyzer having a mechanism for observing a sample surface, for analyzing a sample 3 by irradiating X-ray 4 thereupon within a chamber 2, comprises: a viewer apparatus 11 for letting the sample to be viewed; and an illumination means 31 for illuminating a surface of the sample 3, by irradiating an illuminating light B upon the surface of the sample 3 obliquely, while suppressing an incidence of a reflecting light of the illuminating light B upon the viewer apparatus 11. With such the construction, a shape of a contaminated portion, a residue or the like, upon the sample surface, can be clearly observed under dark field on the viewer apparatus 11, while keeping the sample 3 set within the x-ray spectroscopic analyzer 1.