Patents by Inventor Akihiro Kurisu

Akihiro Kurisu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10790409
    Abstract: A nitride semiconductor light-emitting element includes at least an n-type nitride semiconductor layer, a light-emitting layer, and a p-type nitride semiconductor layer. A multilayer body is provided between the n-type nitride semiconductor layer and the light-emitting layer, having at least one stack of first and second semiconductor layers. The second semiconductor layer has a greater band-gap energy than the first semiconductor layer. The first and second semiconductor layers each have a thickness of more than 10 nm and 30 nm or less. In applications in which luminous efficiency at room temperature is a high priority, the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and the light-emitting layer has V-shaped recesses in cross-sectional view.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: September 29, 2020
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yoshihiko Tani, Tetsuya Hanamoto, Masanori Watanabe, Akihiro Kurisu, Katsuji Iguchi, Hiroyuki Kashihara, Tomoya Inoue, Toshiaki Asai, Hirotaka Watanabe
  • Publication number: 20190006555
    Abstract: A nitride semiconductor light-emitting element includes at least an n-type nitride semiconductor layer, a light-emitting layer, and a p-type nitride semiconductor layer. A multilayer body is provided between the n-type nitride semiconductor layer and the light-emitting layer, having at least one stack of first and second semiconductor layers. The second semiconductor layer has a greater band-gap energy than the first semiconductor layer. The first and second semiconductor layers each have a thickness of more than 10 nm and 30 nm or less. In applications in which luminous efficiency at room temperature is a high priority, the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and the light-emitting layer has V-shaped recesses in cross-sectional view.
    Type: Application
    Filed: August 13, 2018
    Publication date: January 3, 2019
    Inventors: Yoshihiko TANI, Tetsuya HANAMOTO, Masanori WATANABE, Akihiro KURISU, Katsuji IGUCHI, Hiroyuki KASHIHARA, Tomoya INOUE, Toshiaki ASAI, Hirotaka WATANABE
  • Patent number: 10084111
    Abstract: A nitride semiconductor light-emitting element includes at least an n-type nitride semiconductor layer, a light-emitting layer, and a p-type nitride semiconductor layer. A multilayer body is provided between the n-type nitride semiconductor layer and the light-emitting layer, having at least one stack of first and second semiconductor layers. The second semiconductor layer has a greater band-gap energy than the first semiconductor layer. The first and second semiconductor layers each have a thickness of more than 10 nm and 30 nm or less. In applications in which luminous efficiency at room temperature is a high priority, the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and the light-emitting layer has V-shaped recesses in cross-sectional view.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: September 25, 2018
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yoshihiko Tani, Tetsuya Hanamoto, Masanori Watanabe, Akihiro Kurisu, Katsuji Iguchi, Hiroyuki Kashihara, Tomoya Inoue, Toshiaki Asai, Hirotaka Watanabe
  • Publication number: 20170294554
    Abstract: A nitride semiconductor light-emitting element includes at least an n-type nitride semiconductor layer, a light-emitting layer, and a p-type nitride semiconductor layer. A multilayer body is provided between the n-type nitride semiconductor layer and the light-emitting layer, having at least one stack of first and second semiconductor layers. The second semiconductor layer has a greater band-gap energy than the first semiconductor layer. The first and second semiconductor layers each have a thickness of more than 10 nm and 30 nm or less. In applications in which luminous efficiency at room temperature is a high priority, the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and the light-emitting layer has V-shaped recesses in cross-sectional view.
    Type: Application
    Filed: August 31, 2015
    Publication date: October 12, 2017
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Yoshihiko TANI, Tetsuya HANAMOTO, Masanori WATANABE, Akihiro KURISU, Katsuji IGUCHI, Hiroyuki KASHIHARA, Tomoya INOUE, Toshiaki ASAI, Hirotaka WATANABE
  • Patent number: 9318645
    Abstract: A nitride semiconductor light-emitting element includes a second light-emitting layer, a third barrier layer, and a first light-emitting layer from a side close to a p-type nitride semiconductor layer. The first light-emitting layer includes a plurality of first quantum well layers and a first barrier layer provided between the plurality of first quantum well layers. The second light-emitting layer includes a plurality of second quantum well layers and a second barrier layer provided between the plurality of second quantum well layers. The second quantum well layers include a multiple quantum well light-emitting layer thicker than the first quantum well layers.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: April 19, 2016
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yoshihiko Tani, Tadashi Takeoka, Akihiro Kurisu, Tetsuya Hanamoto, Mathieu Senes
  • Publication number: 20150076447
    Abstract: A nitride semiconductor light-emitting element includes a second light-emitting layer, a third barrier layer, and a first light-emitting layer from a side close to a p-type nitride semiconductor layer. The first light-emitting layer includes a plurality of first quantum well layers and a first barrier layer provided between the plurality of first quantum well layers. The second light-emitting layer includes a plurality of second quantum well layers and a second barrier layer provided between the plurality of second quantum well layers. The second quantum well layers include a multiple quantum well light-emitting layer thicker than the first quantum well layers.
    Type: Application
    Filed: October 16, 2013
    Publication date: March 19, 2015
    Inventors: Yoshihiko Tani, Tadashi Takeoka, Akihiro Kurisu, Tetsuya Hanamoto, Mathieu Senes