Abstract: An object of the present invention is to provide an inorganic core/shell particle to be contained in an abrasive material that contains a reduced amount of cerium, can polish harder workpieces at a high polishing rate, and can decrease the surface roughness of the workpieces. The inorganic core/shell particle P of the present invention is to be contained in an abrasive material and includes a core (1) containing a salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb) and a shell (2) containing a salt of at least one element selected from these eight elements and a salt of cerium (Ce), wherein the crystallites in the shell (2) have an average diameter within a range of 4 to 30 nm.

Abstract: Technique to provide an abrasive regeneration method which, from a used abrasive, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia, zirconium oxide and cerium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, an abrasive recovery step (C) for recovering the separated and concentrated abrasive, and a second concentration step (D) for filter-treating the concentrated abrasive.

Abstract: A method of manufacturing abrasive material particles includes: forming a core layer from an aqueous solution containing a salt of a first element; forming an intermediate layer by adding an aqueous solution containing a salt of a second element and a salt of Ce to the reaction solution; forming a shell layer by adding an aqueous solution containing a salt of Ce to the reaction solution; a solid/liquid separating step; wherein the additions per unit time of the first element, the combination of the second element and Ce, and Ce contained in the aqueous solutions to be added are adjusted so as not to decrease, and the addition of Ce contained in the aqueous solution to be last added in the shell layer forming step is increased compared with the addition of the first element contained in the aqueous solution to be first added in the core layer forming step.

Abstract: Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing material is reclaimed from a polishing-material slurry including already used polishing material by undergoing: recovering the polishing-material slurry used to polish an object having silicon as a main component thereof; adjusting the pH of the recovered polishing-material slurry to be in the range of 7-10; adding an alkali earth metal-containing metal salt as an inorganic salt to the pH adjusted polishing-material slurry, to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; and the polishing material, having been separated and concentrated, is subjected to solid-liquid separation, and recovered.

Abstract: A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol% inclusive.

Abstract: Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing is reclaimed from a polishing-material slurry by undergoing: recovering in step (A) a polishing-material slurry including already used polishing material; adding in step (B) an alkali earth metal-containing metal salt to the recovered polishing-material slurry to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; the polishing material, having had been separated and concentrated, is subjected in step (C) to solid-liquid separation, and recovered; and using in step (D) a magnetic filter to filter and remove metal particles included in the polishing-material slurry. Step (D) is performed at the same time as step (B) or step (C), or performed after either step (A), step (B), or step (C).

Abstract: In order to use less cerium oxide and achieve higher durability and polishing speeds, these abrasive particles used in an abrasive have: a shell layer (3) which is the outermost shell layer of the abrasive particles and is formed with cerium oxide as the main component; and a middle layer (2) which contains cerium oxide and an oxide of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals, and which is formed closer to the center of the abrasive particles than the shell layer (3).

Abstract: An abrasive composition to be used in an abrasive material, including an inorganic abrasive particle. The particle comprises a shell layer being an outermost layer and mainly composed of cerium oxide; and an intermediate layer comprising cerium oxide and an oxide of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and formed on an inner side of the shell layer. The abrasive composition also includes an organic base member comprising a polymerizable compound, wherein an outer surface of the organic base member is covered with the inorganic abrasive particle.

Abstract: Technique to provide an abrasive regeneration method which, from a used abrasive slurry, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia and zirconium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, and an abrasive recovery step (C) for recovering the separated and concentrated abrasive.

Abstract: Method for separating a polishing material, which is capable of separating and recovering cerium oxide from a used polishing material that is mainly composed of cerium oxide and a regenerated polishing material which can be obtained by the separation method. This method for separating a polishing material is characterized in that a divalent alkaline earth metal salt is added into the slurry of the used polishing material, while controlling the temperature of the slurry within the range of 10-70 DEG C., thereby causing the polishing material to aggregate under such conditions that the mother liquor has a pH of less than 10.0 as the pH is converted to one at 25 DEG C. so that the polishing material is separated from the mother liquor.

Abstract: Abrasive material regeneration method regenerates a cerium oxide abrasive material from a used abrasive material slurry containing the cerium oxide abrasive material and resulting from grinding a grinding subject having silicon as the primary component, characterized by regenerating the abrasive material containing cerium oxide through: a slurry recovery step (A) for recovering an abrasive material slurry discharged from a grinder; an isolation/concentration step (B) for adding a magnesium salt as an inorganic salt to the recovered abrasive material slurry, aggregating the abrasive material under the condition that the pH value of the mother liquor converted to 25 DEG C is at least 6.5 and less than 10.0, and thus isolating and concentrating the abrasive material from the mother liquor; and an abrasive material recovery step (C) for recovering the isolated and concentrated abrasive material.

Abstract: Provided are fine abrasive particles which have a high rate of polishing and generate few polishing flaws. A process for producing then abrasive particles is also provided in which the fine abrasive particles have a reduced coefficient of fluctuation in particle diameter, the production steps are simple, and the production cost is low. The fine abrasive particles comprise cerium oxide, at least one element selected from La, Pr, Nd, Sm, and Eu, and one or more element selected from Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu, and are characterized in that the cerium oxide has a Ce content of 20 mol % or higher and that the sum (mol %) of the content of the at least one element selected from La, Pr, Nd, Sm, Nd Eu and the content of Ce in the cerium oxide is greater than the sum (mol %) of the contents of the one or more elements selected from Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu.

Abstract: Provided is a method for recovering an abrasive material component from used slurry having cerium oxide as the principle component of the abrasive material therein, the abrasive component recovery method being one in which post-recovery treatment of the abrasive agent and waste liquid is easy. Also provided is cerium oxide recovered through the novel recovery method. A method for recovering an abrasive material component from used abrasive slurry containing cerium oxide in the abrasive material thereof is characterized in that the abrasive material component is recovered by: adding a magnesium salt to the used abrasive slurry; coagulating the abrasive material component and causing the sale to sediment from the abrasive slurry, which contains the abrasive material component and components derived from the material subjected to abrasion; and separating the solids and liquids.

Abstract: This invention relates to a halide-containing stimulable phosphor having improved moisture resistance and luminance, and a process for producing the same. The halide-containing stimulable phosphor is characterized in that, among elements constituting the outermost surface and inside of the phosphor, there is a difference in composition ratio of a halogen element between the outermost surface and the inside of the phosphor. A radiation image conversion panel, which has been improved, for example, in moisture resistance, luminance and image quality by using the phosphor, and a process for producing the same are also provided.

Abstract: A radiation image storage panel which is provided with a stimulable phosphor substance layer containing a stimulable phosphor substance formed by a gas phase accumulation method on a support, wherein said stimulable phosphor substance layer is constituted of a columnar crystal structure, and slopes D1 and D2 satisfy 0°?|D1?D2|?40°, when acute angles formed by said radiation image storage panel surface and axial lines passing through the center of said columnar crystals, with respect to columnar crystals at arbitrary two points in the radiation image storage panel plane, are designated as slopes of columnar crystals, D1 and D2.

Abstract: In a radiographic image conversion panel including a photostimulable phosphor layer on a support, at least one layer of the photostimulable phosphor layer is formed by a deposition method and has a film thickness of 50 ?m to 10 mm, and the support includes a plurality of layers of two or more kind.

Abstract: A radiation image conversion panel exhibiting enhanced luminance and superior sharpness is disclosed, comprising on a support a stimulable phosphor layer, wherein the stimulable phosphor layer which has been formed by gas phase deposition has a thickness of 50 ?m to 1 mm, and a protective layer composed of a thermosetting resin or a thermoplastic resin is further provided on the stimulable phosphor layer.

Abstract: A radiation image conversion panel is disclosed, comprising on a support a stimulable phosphor layer comprising a stimulable phosphor, wherein the stimulable phosphor layer is layer formed of columnar crystals of a parent component of a stimulable phosphor and further thereon a layer formed of columnar crystals of the parent component and an activator component, wherein the second columnar crystals are formed with (200) orientation through vapor deposition. There is also disclosed a preparation method thereof.

Abstract: A radiation image conversion panel is disclosed, comprising on a support at least one stimulable phosphor layer comprising a stimulable phosphor, wherein the stimulable phosphor layer is a layer of vapor-deposited stimulable phosphor having a thickness of 50 ?m to 20 mm, and the support exhibits a thermal conductivity of 0.1 to 20 W/mK. A preparation method thereof is also disclosed.

Abstract: A radiation image conversion panel exhibiting superior homogeneity of an activator in a phosphor layer and enhanced luminance and sharpness, and a preparation method of the same. Described is the radiation image conversion panel having a stimulable phosphor layer on a support. The stimulable phosphor layer is formed by a vapor-phase growth process so as to have a layer thickness of 50 ?m to 1 mm after a thermoplastic resin film is prepared on the support or the stimulable phosphor layer mentioned above is formed on a support composed of a thermoplastic resin containing a carbon fiber.