Patents by Inventor Akihiro Miyauchi

Akihiro Miyauchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8603380
    Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8562896
    Abstract: An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: October 22, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Publication number: 20130260095
    Abstract: A glass substrate having a fine structure on the surface thereof, wherein said glass substrate is made of vanadium-containing glass and said vanadium-containing glass has a resistivity no higher than 109 ?·cm, with the content of vanadium (in the form of V2O5) being no less than 10 wt % and no more than 60 wt %. The glass substrate prevents dust attraction and retains its antifouling properties over a long period of time.
    Type: Application
    Filed: February 19, 2013
    Publication date: October 3, 2013
    Applicant: HITACHI, LTD.
    Inventors: Yuzuru SHIMAZAKI, Takashi NAITO, Takuya AOYAGI, Yuichi SAWAI, Tadashi FUJIEDA, Akihiro MIYAUCHI, Masahiko OGINO
  • Patent number: 8491291
    Abstract: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: July 23, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Ando, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20130082029
    Abstract: The object of the present invention is to provide a stamper or an imprint device which can reduce a variation of a base film thickness, a product processed and having a precise fine pattern, and a device for manufacturing a product processed or a method for manufacturing a product processed which can form a precise fine pattern. According to the present invention, in a stamper, an imprint device performing an imprint using the stamper, a device for manufacturing a product processed by the imprint device, a method for manufacturing a product processed by the imprint, and a product processed and manufactured, the stamper has a dummy pattern which is unnecessary for fulfilling a function of the product processed which is formed of a substrate for the product.
    Type: Application
    Filed: August 2, 2012
    Publication date: April 4, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tetsuhiro HATOGAI, Kyoichi MORI, Makoto MARUYAMA, Akihiro MIYAUCHI, Masahiko OGINO
  • Patent number: 8387255
    Abstract: The fine pattern mold that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: March 5, 2013
    Assignee: Hitachi Industrial Equipment Systems Co., Ltd.
    Inventors: Masahiko Ogino, Mitsuru Hasegawa, Kenya Ohashi, Akihiro Miyauchi, Hitoshi Suzuki, Toshio Haba, Haruo Akahoshi
  • Publication number: 20130011632
    Abstract: Provided is a method for producing a microfine structure comprising the steps of: forming a resin film by applying a liquid polymerizable resin composition containing a high molecular weight component, a low molecular weight component and a reactive dilution component to an adhesion promoting layer formed on a substrate; imprinting a mold with an extremely fine convex concave pattern onto the resin film; and transferring the convex concave pattern to the resin film. Herein, components of the adhesion promoting layer, the high molecular weight component, the low molecular weight component and the reactive dilution component respectively have cross-linking reactive functional groups which react with each other.
    Type: Application
    Filed: December 22, 2010
    Publication date: January 10, 2013
    Inventors: Masahiko Ogino, Susumu Komoriya, Akihiro Miyauchi, Ryuta Washiya, Kyoichi Mori, Noritake Shizawa
  • Publication number: 20130001835
    Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
    Type: Application
    Filed: September 5, 2012
    Publication date: January 3, 2013
    Inventors: Satoshi ISHII, Masahiko OGINO, Noritake SHIZAWA, Kyoichi MORI, Akihiro MIYAUCHI
  • Publication number: 20120321738
    Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.
    Type: Application
    Filed: February 16, 2011
    Publication date: December 20, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Publication number: 20120319326
    Abstract: The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.
    Type: Application
    Filed: March 10, 2011
    Publication date: December 20, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshimitsu Shiraishi, Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Masahiko Ogino, Akihiro Miyauchi
  • Patent number: 8309265
    Abstract: The present invention provides an electrolyte membrane for a fuel cell that has a minute projection cluster on one side or both sides of a polymer electrolyte membrane. Further, the present invention provides a production method of an electrolyte membrane for a fuel cell, wherein a mold comprising convex portions having a fixed planar pattern is pressed on one side or both sides of a polymer electrolyte membrane, then while concave portions of the polymer electrolyte membrane formed in the concave portions are being stretched, the mold is removed from the polymer electrolyte membrane for forming a minute projection cluster.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: November 13, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Akihiro Miyauchi, Kenichi Souma, Shuichi Suzuki, Yoshiyuki Takamori, Masahiko Ogino, Takashi Ando, Hidetoshi Honbo
  • Publication number: 20120256346
    Abstract: A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
    Type: Application
    Filed: June 19, 2012
    Publication date: October 11, 2012
    Inventors: Masahiko Ogino, Akihiro Miyauchi, Sigehisa Motowaki, Kosuke Kuwabara
  • Publication number: 20120256353
    Abstract: A pattern transfer apparatus for pressing a mold having a fine concave/convex pattern onto a transferred material, peeling off the mold from the transferred material, and transferring the concave/convex pattern onto a surface of the transferred material includes: a pretreatment mechanism configured to perform a predetermined surface treatment to at least one of the mold and the transferred material before the concave/convex pattern is transferred; an information recording mechanism configured to record information of the surface treatment performed by the pretreatment mechanism at a position associated with an area of the transferred material where the concave/convex pattern is transferred onto the area; an interpretation mechanism configured to read the recorded information; and an after-treatment mechanism configured to perform a predetermined after-treatment to the area where the concave/convex pattern is transferred, based on the information interpreted by the interpretation mechanism.
    Type: Application
    Filed: March 8, 2012
    Publication date: October 11, 2012
    Inventors: Mitsuru HASEGAWA, Hajime Murakami, Akihiro Miyauchi, Masahiko Ogino
  • Patent number: 8268209
    Abstract: In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: September 18, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Masahiko Ogino, Akihiro Miyauchi, Takashi Ando, Chiseki Haginoya, Susumu Komoriya, Yasunari Sohda, Souichi Katagiri, Hiroya Ohta, Yoshinori Nakayama
  • Patent number: 8261392
    Abstract: A method of manufacturing a sole according to the present invention includes the steps of obtaining a rubber part by previously crosslinking a polymer mixture containing 50 to 100 mass % of a diene-based polymer and 0 to 40 mass % of an acrylonitrile component in a polymer component of the polymer mixture, halogenating the rubber part, and bonding the rubber part and thermoplastic resin to each other by molding said thermoplastic resin on said rubber part.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: September 11, 2012
    Assignee: Mizuno Corp.
    Inventors: Yoshihiro Yabushita, Akihiro Miyauchi, Takeshi Takeshita
  • Publication number: 20120205838
    Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 16, 2012
    Inventors: Ryuta WASHIYA, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Publication number: 20120195993
    Abstract: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
    Type: Application
    Filed: February 6, 2012
    Publication date: August 2, 2012
    Inventors: Takashi ANDO, Susumu KOMORIYA, Masahiko OGINO, Akihiro MIYAUCHI
  • Patent number: 8192637
    Abstract: A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: June 5, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Ryuta Washiya, Takashi Ando, Masahiko Ogino, Akihiro Miyauchi
  • Patent number: 8186992
    Abstract: In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper.
    Type: Grant
    Filed: January 22, 2010
    Date of Patent: May 29, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryuta Washiya, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8175894
    Abstract: A radiation report system includes a storage unit for storing a plurality of records including an exposure dose, an examination protocol, an examination part, a patient's age and a patient's weight with regard to the plurality of radiation examinations using a plurality of radiation diagnosis apparatuses. The plurality of records stored in the storage unit is classified into a plurality of groups based on the examination protocol, the examination part or patient information. An exposure report is created for each group based on the plurality of records stored in the storage unit. The data of the exposure report is served with a client side terminal.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: May 8, 2012
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Medical Systems Corporation
    Inventors: Naoki Oowaki, Yoichi Takada, Satoshi Ikeda, Fumiaki Teshima, Akihiro Miyauchi