Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time ?t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.

Abstract: A liquid crystal display including a liquid crystal panel and an organic EL device, which functions as a backlight. The organic EL device includes a Peltier element, which functions as a substrate, and an organic EL element formed on the Peltier element. The organic EL element includes an organic EL layer and first and second electrodes, which sandwich the organic EL layer. The first electrode is shared with a metal layer, which is a heat absorbing electrode of the Peltier element. The second electrode is formed from ITO, which transmits visible light. Light emitted from the organic EL element exits from the second electrode. As a result, the organic EL device is thin and has a superior cooling effect.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.

Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

Abstract: A reactor comprising a body made of a heat-resistant material and having an inlet and an outlet for water/moisture gas, having a gas-diffusing member provided in an internal space of the body, and having a platinum coating on an internal wall surface of the body. Hydrogen and oxygen fed from the inlet are diffused by the gas-diffusing member and then come into contact with the platinum coating to enhance reactivity, thereby producing water. A temperature of the reactor is held to be below an ignition temperature of hydrogen or a hydrogen-containing gas. The platinum-coated catalyst layer on the internal wall of the reactor body is formed by treating the surface of the internal wall of the body, cleaning the treated surface, forming a barrier coating of a nonmetallic material of an oxide or nitride on the wall surface, and forming the platinum coating on the barrier coating.

Abstract: A grinding machine for welding electrodes comprises a housing 1, grinder motor 2, grinding disk 3, swing plate 4, holder guide 6, electrode holder 7, electrode turning motor 8 and swing plate moving mechanism 9. The axis &phgr;a of electrode A extends along a line perpendicular to the axis &phgr; of motor drive shaft 2a and first grinding part 3a of the grinding disk is formed to conform to the finishing contour of electrode A. The grinding disk is turned by the grinder motor and at the same time electrode A is turned by the electrode turning motor. The grinding machine, using one grinding disk, grinds the end portion of an electrode to final form and finishes the tip end of the electrode to a mirror surface.

Abstract: A gas detection sensor permits precise measurement of the concentration of flammable gas in a detection or subject gas and the concentration of oxygen in a detection gas containing flammable gases. In the sensor, the heating of the sensor by contact catalytic reaction of flammable gas gives off a detection signal of the flammable gas. The gas detection sensor has a first detection sensor including a diaphragm having a platinum coat on a side which the flowing detection gas comes in contact with, and a thermocouple having respective ends of two different metals placed close to each other and fixed on the side of the diaphragm not coming in contact with the flowing detection gas and which is heated by the contact catalytic reaction of flammable gas. A second detection sensor similar to the first detection sensor detects the temperature of the flowing detection gas.

Abstract: A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.

Abstract: An unreacted gas detector including a reactor unit for producing a target gas by way of reacting material gases in its reaction chamber, a sensor body connected to the reactor unit, a measurement space provided in the sensor body for allowing the target gas to flow, an unreacted gas sensor having a temperature measurement section covered by a catalyst layer and disposed inside the measurement space, and a target gas sensor with its temperature measurement section disposed in the sensor body. Any unreacted gas remaining in the target gas is reacted by the catalyst layer so that a resulted temperature change is detected by the unreacted gas sensor, and a target gas temperature is measured by target gas temperature sensor, thus finding a unreacted gas concentration from a temperature difference between the temperatures obtained by the unreacted gas sensor and the target gas temperature sensor.

Abstract: A reactor (2) for generating moisture in which the starting material gases are caused to undergo turbulence so as to increase the efficiency of the moisture-generating reaction.

Abstract: A fluid control device comprises a first passageway, and a second passageway communicating therewith and having a terminating end closed with a fluid control unit or instrument. The first passageway is adapted to pass a fluid therethrough with a different fluid remaining in the second passageway. The first passageway comprises an upstream portion and a downstream portion communicating with the upstream portion at an approximate right angle therewith. The second passageway extends from a terminating end of the upstream portion of the first passageway in alignment with the upstream portion.

Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Abstract: A fluid control device comprises a first passageway, and a second passageway communicating therewith and having a terminating end closed with a fluid control unit or instrument. The first passageway is adapted to pass a fluid therethrough with a different fluid remaining in the second passageway. The first passageway comprises an upstream portion and a downstream portion communicating with the upstream portion at an approximate right angle therewith. The second passageway extends from a terminating end of the upstream portion of the first passageway in alignment with the upstream portion.

Abstract: A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.