Patents by Inventor Akihiro Shimamoto

Akihiro Shimamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240103371
    Abstract: A photo treatment device includes a gas generator that generates a mixed gas in which a raw material gas containing an organic compound having at least one of oxygen atoms and nitrogen atoms is mixed with a carrier gas at a desired mixing ratio; a chamber connected to the gas generator for allowing ventilation so as to enable the mixed gas to be supplied thereinside and that is capable of placing the workpiece thereinside; and a light source that irradiates the raw material gas with ultraviolet light having intensity at least in a wavelength band of 205 nm or less. The surface of the workpiece is modified with the raw material gas that has been irradiated with the ultraviolet light.
    Type: Application
    Filed: January 26, 2022
    Publication date: March 28, 2024
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventor: Akihiro Shimamoto
  • Publication number: 20230340220
    Abstract: Provided is a fluorine resin surface modification method wherein an object to be processed and a processing device and the like are not readily damaged, wherefrom the risk of harmfully impacting a human body is small, and which can be carried out with simple equipment. The fluorine resin surface modification method including the steps of: irradiating an organic compound containing an oxygen atom with ultraviolet light having at least an intensity in a wavelength range of 205 nm or less to generate a radical; and bringing the radical into contact with a surface of a fluorine resin to form a hydrophilized layer on the surface.
    Type: Application
    Filed: July 20, 2021
    Publication date: October 26, 2023
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventor: Akihiro SHIMAMOTO
  • Publication number: 20230211385
    Abstract: Provided is a reduction treatment method in which hydrogen radicals are efficiently generated in an amount required for reduction treatment and the surface of an object to be treated is reduced by a relatively simple treatment process. A reduction treatment method including: irradiating a hydrogen radical source-containing material with ultraviolet light having a wavelength of 255 nm or less to generate hydrogen radicals; and bringing the generated hydrogen radicals into contact with a surface of an object to be treated to reduce the surface.
    Type: Application
    Filed: April 7, 2021
    Publication date: July 6, 2023
    Applicant: Ushio Denki Kabushiki Kaisha
    Inventor: Akihiro SHIMAMOTO
  • Publication number: 20230093040
    Abstract: The present invention relates to a method for treating wastewater containing a furan compound, a microbial preparation for use in the method, a method for high density culture of a microorganism for use in the above method, and a method for producing a microbial preparation by using the culture method.
    Type: Application
    Filed: September 22, 2022
    Publication date: March 23, 2023
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Akihiro Shimamoto, Yasuhito Yamamoto, Shuichi Yunomura, Takatoshi Kimura, Michiru Kamizono