Abstract: A liquid discharge device includes a container configured to contain a liquid; a discharge port which is formed by bonding a plurality of substrates and from which the liquid supplied from the container is discharged; a piezoelectric element provided in correspondence with the discharge port, and configured to generate energy for discharging the liquid from the discharge port; and a detection unit configured to detect peeling of a bonding surface between the plurality of substrates forming the discharge port.

Abstract: A liquid discharge apparatus including a head configured to discharge a liquid, a chamber configured to contain the head, a circulation system configured to circulate a gas inside the chamber, an exhaust system configured to operate to exhaust the gas to an outside of the chamber, a filter provided in the circulation system and configured to remove a removal target contained in the gas, a detection unit configured to indirectly detect the removal target by detecting a detection target that is contained in the gas and different from the removal target, and a controller configured to operate the exhaust system when a concentration of the detection target detected by the detection unit is not lower than a threshold.

Abstract: An ejection device includes: an ejection unit provided with an ejection port configured to eject an ejection material; a piezoelectric element configured to cause the ejection material to be ejected from the ejection unit; a first liquid chamber connected to the ejection unit and configured to supply the ejection unit with the ejection material; a pressure control unit configured to control a pressure in the ejection unit by controlling a pressure in the first liquid chamber; and a detection unit configured to detect a wetness of an ejection port side surface.

Abstract: A liquid ejection device, a cleaning apparatus and a cleaning method for a module substrate, which can remove foreign matter on an ejection opening face and in a flow path connected with an ejection opening is provided. For that purpose, an ejection opening face is covered with liquid, cleaning is performed by driving a device configured to vibrate liquid, and after that the liquid is collected.

Abstract: An ejection device includes: an ejection unit provided with an ejection port configured to eject an ejection material; a piezoelectric element configured to cause the ejection material to be ejected from the ejection unit; a first liquid chamber connected to the ejection unit and configured to supply the ejection unit with the ejection material; a pressure control unit configured to control a pressure in the ejection unit by controlling a pressure in the first liquid chamber; and a detection unit configured to detect a wetness of an ejection port side surface.

Abstract: Method of forming a pattern by arranging a photocurable composition on a substrate; bringing a mold having a concavo-convex pattern into contact with the composition; irradiating the composition with light to form a cured film; releasing the mold from the cured film; forming a reversal layer on the cured film having a concavo-convex pattern transferred from the mold; partially removing the reversal layer to expose the convexes of the pattern in such a manner that the reversal layer remains in the concaves of the pattern formed on the cured film; and etching the photocurable composition layer using the reversal layer remaining in the concaves as a mask to form a reversal pattern, wherein the mold is brought into contact with the photocurable composition in an atmosphere of a soluble gas having a solubility in the composition; and the soluble gas has a saturation solubility of 38% by volume or more.

Abstract: An imprint apparatus forms a pattern by curing a radical polymerizable imprint material by irradiating the imprint material with light in a state in which a mold is brought into contact with the imprint material. The apparatus includes an irradiator configured to irradiate the imprint material with light, and a controller configured to control the irradiator. Letting Ic be an illuminance of the light with which the imprint material is irradiated, tc be a time during which the imprint material is irradiated with the light, k be a coefficient, and PD be a target degree of photopolymerization of the imprint material subjected to irradiation with the light, the controller determines the irradiation time in accordance with: PD=k×(?Ic)×tc.

Abstract: A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the curable composition (A1) layer to lay the droplets, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a Distance in Hansen space Ra((a1)?(A2)) between the component (a1) serving as a polymerizable compound in the curable composition (A1) and the curable composition (A2) being 6 or less.

Abstract: The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1): a value ECG of greater than or equal to 2.30 GPa, where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm2 in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.

Abstract: A liquid ejection device, a cleaning apparatus and a cleaning method for a module substrate, which can remove foreign matters on an ejection opening face and in a flow path connected with an ejection opening is provided. For that purpose, an ejection opening face is covered with liquid, cleaning is performed by driving a device configured to vibrate liquid, and after that the liquid is collected.

Abstract: A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the curable composition (A1) layer to lay the droplets, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a Distance in Hansen space Ra((a1)?(A2)) between the component (a1) serving as a polymerizable compound in the curable composition (A1) and the curable composition (A2) being 6 or less.

Abstract: An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light-cured composition after the release.

Abstract: In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): (A) polymerizable compound, and (B) photopolymerization initiator. Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.

Abstract: Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is ?1.0% to 3.0%.

Abstract: An imprinting method for forming a pattern of a cured product by irradiating a curable composition for imprinting disposed on a substrate with light while the curable composition is in contact with a mold having surface asperities and removing the mold from a cured product of the curable composition. The method includes bringing the mold into contact with the curable composition in a condensable gas atmosphere, wherein the curable composition for imprinting has a viscosity in the range of 1 cP to 40 cP in air at 23° C., and the condensable gas is introduced between the mold and the curable composition such that the curable composition for imprinting has a condensable gas solubility (gas/(curable composition+gas)) (g/g) in the range of 0.1 to 0.4.

Abstract: A pattern is formed by arranging a photocurable composition on a substrate; bringing a mold having a concavo-convex pattern into contact with the composition; irradiating the composition with light to form a cured film; releasing the mold from the cured film; forming a reversal layer on the cured film having a concavo-convex pattern transferred from the mold; partially removing the reversal layer to expose the convexes of the pattern in such a manner that the reversal layer remains in the concaves of the pattern formed on the cured film; and etching the photocurable composition layer using the reversal layer remaining in the concaves as a mask to form a reversal pattern, wherein the mold is brought into contact with the photocurable composition in an atmosphere of a soluble gas having a solubility in the composition; and the soluble gas has a saturation solubility of 38% by volume or more.

Abstract: The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1): a value ECG of greater than or equal to 2.30 GPa, where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm' in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.

Abstract: A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the curable composition (A1) layer to lay the droplets, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a Distance in Hansen space Ra((a1)?(A2)) between the component (a1) serving as a polymerizable compound in the curable composition (A1) and the curable composition (A2) being 6 or less.

Abstract: An imprint apparatus forms a pattern by curing a radical polymerizable imprint material by irradiating the imprint material with light in a state in which a mold is brought into contact with the imprint material. The apparatus includes an irradiator configured to irradiate the imprint material with light, and a controller configured to control the irradiator. Letting Ic be an illuminance of the light with which the imprint material is irradiated, tc be a time during which the imprint material is irradiated with the light, k be a coefficient, and PD be a target degree of photopolymerization of the imprint material subjected to irradiation with the light, the controller determines the irradiation time in accordance with: PD=k×(?Ic)×tc.

Abstract: In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): (A) polymerizable compound, and (B) photopolymerization initiator. Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.