Patents by Inventor Akiko YOSHII

Akiko YOSHII has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11112693
    Abstract: Provided are a curable coloring composition which is suitable for the production of a cured film in cyan color, having good moisture resistance, a color filter, an image sensor, and a method for producing a cured film. The curable coloring composition includes a coloring agent including a phthalocyanine pigment having Al as a central metal, a basic pigment derivative, and a curable compound, in which the coloring agent includes 80% by mass or more of the phthalocyanine pigments, and the content of the phthalocyanine pigment having Al as a central metal among the phthalocyanine pigments is 30% by mass or more.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: September 7, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Naotsugu Muro, Yousuke Murakami, Seongmu Bak, Akiko Yoshii
  • Patent number: 10641935
    Abstract: Provided are a coloring composition capable of producing a film having fewer defects generated, and the like even in a case where the coloring composition is stored for a long period of time in an environment with variations in temperature, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a heterocycle-containing coloring agent such as a compound represented by Formula (1), a phthalimide compound, a solvent, and a resin. In Formula (1), R1 to R13 each independently represent a hydrogen atom or a substituent, and adjacent groups of R1 to R8 may be bonded to each other to form a ring, provided that at least one of the pairs of adjacent two groups of R1 to R8 is bonded to each other to form an aromatic ring.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: May 5, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Naotsugu Muro, Seongmu Bak, Akiko Yoshii, Yoshinori Taguchi, Yousuke Murakami
  • Patent number: 10634997
    Abstract: Provided is a coloring composition capable of producing a cured film having suppressed color unevenness even in a case where the coloring composition is used after being stored for a long period of time. In addition, provided are a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a halogenated zinc phthalocyanine pigment, a maleimide compound, a curable compound other than the maleimide compound, and a solvent, in which the molecular weight of the maleimide compound is 100 to 400, and the content of the maleimide compound is 0.08 to 0.8 parts by mass with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: April 28, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Seongmu Bak, Naotsugu Muro, Yoshinori Taguchi, Akiko Yoshii, Yousuke Murakami
  • Publication number: 20190212644
    Abstract: Provided is a photosensitive composition capable of Ruining a pattern having excellent rectangularity and solvent resistance. Provided are also a cured film, a pattern forming method, a color filter, a solid-state imaging element, and an image display device. This photosensitive composition includes a white or colorless pigment A, an alkali-soluble resin B, a polymerizable compound C having an ethylenically unsaturated double bond, a photopolymerization initiator D1 having a light absorption coefficient of 1.0×103 mL/gcm or more at a wavelength of 365 nm in methanol, and a photopolymerization initiator D2 having a light absorption coefficient of 1.0×102 mL/gcm or less at a wavelength of 365 nm in methanol and a light absorption coefficient of 1.0×103 mL/gcm or more at a wavelength of 254 nm, in which the mass ratio of the photopolymerization initiator D1 to the photopolymerization initiator D2 is photopolymerization initiator D1:photopolymerization initiator D2=90:10 to 40:60.
    Type: Application
    Filed: March 18, 2019
    Publication date: July 11, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Hiroyuki Morishita, Kazuya Oota, Yoshinori Taguchi, Akiko Yoshii
  • Patent number: 10241247
    Abstract: A coloring composition includes Color Index Pigment Red 264, a graft resin having an acid group, a photopolymerizable compound, and a photopolymerization initiator.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: March 26, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Tetsuya Kamimura, Akiko Yoshii
  • Publication number: 20180348630
    Abstract: Provided are a curable coloring composition which is suitable for the production of a cured film in cyan color, having good moisture resistance, a color filter, an image sensor, and a method for producing a cured film. The curable coloring composition includes a coloring agent including a phthalocyanine pigment having Al as a central metal, a basic pigment derivative, and a curable compound, in which the coloring agent includes 80% by mass or more of the phthalocyanine pigments, and the content of the phthalocyanine pigment having Al as a central metal among the phthalocyanine pigments is 30% by mass or more.
    Type: Application
    Filed: August 8, 2018
    Publication date: December 6, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yoshinori TAGUCHI, Naotsugu MURO, Yousuke MURAKAMI, Seongmu BAK, Akiko YOSHII
  • Publication number: 20180329295
    Abstract: Provided is a coloring composition capable of producing a cured film having suppressed color unevenness even in a case where the coloring composition is used after being stored for a long period of time. In addition, provided are a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a halogenated zinc phthalocyanine pigment, a maleimide compound, a curable compound other than the maleimide compound, and a solvent, in which the molecular weight of the maleimide compound is 100 to 400, and the content of the maleimide compound is 0.08 to 0.8 parts by mass with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.
    Type: Application
    Filed: July 24, 2018
    Publication date: November 15, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Seongmu BAK, Naotsugu MURO, Yoshinori TAGUCHI, Akiko YOSHII, Yousuke MURAKAMI
  • Publication number: 20180252852
    Abstract: Provided are a coloring composition capable of producing a film having fewer defects generated, and the like even in a case where the coloring composition is stored for a long period of time in an environment with variations in temperature, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a heterocycle-containing coloring agent such as a compound represented by Formula (1), a phthalimide compound, a solvent, and a resin. In Formula (1), R1 to R13 each independently represent a hydrogen atom or a substituent, and adjacent groups of R1 to R8 may be bonded to each other to form a ring, provided that at least one of the pairs of adjacent two groups of R1 to R8 is bonded to each other to form an aromatic ring.
    Type: Application
    Filed: May 3, 2018
    Publication date: September 6, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Naotsugu MURO, Seongmu BAK, Akiko YOSHII, Yoshinori TAGUCHI, Yousuke MURAKAMI
  • Publication number: 20170269270
    Abstract: A coloring composition includes Color Index Pigment Red 264, a graft resin having an acid group, a photopolymerizable compound, and a photopolymerization initiator.
    Type: Application
    Filed: June 6, 2017
    Publication date: September 21, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yoshinori TAGUCHI, Tetsuya KAMIMURA, Akiko YOSHII
  • Publication number: 20150179471
    Abstract: A method of producing a semiconductor substrate product, having the steps of: providing an etching liquid containing water, a hydrofluoric acid compound, and a water-soluble polymer; and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
    Type: Application
    Filed: February 18, 2015
    Publication date: June 25, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi MIZUTANI, Akiko YOSHII, Tetsuya KAMIMURA, Tetsuya SHIMIZU
  • Patent number: 8940644
    Abstract: A method for manufacturing a semiconductor substrate product having: providing an etching liquid containing water, a hydrofluoric acid compound and an organic solvent, and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: January 27, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Mizutani, Tetsuya Kamimura, Akiko Yoshii, Tetsuya Shimizu
  • Publication number: 20130244443
    Abstract: A method for manufacturing a semiconductor substrate product having: providing an etching liquid containing water, a hydrofluoric acid compound and an organic solvent, and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
    Type: Application
    Filed: February 19, 2013
    Publication date: September 19, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Atsushi MIZUTANI, Tetsuya KAMIMURA, Akiko YOSHII, Tetsuya SHIMIZU
  • Publication number: 20130244444
    Abstract: A method of producing a semiconductor substrate product, having the steps of: providing an etching liquid containing water, a hydrofluoric acid compound, and a water-soluble polymer; and applying the etching liquid to a semiconductor substrate, the semiconductor substrate having a silicon layer and a silicon oxide layer, the silicon layer containing an impurity, and thereby selectively etching the silicon oxide layer.
    Type: Application
    Filed: February 19, 2013
    Publication date: September 19, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Atsushi MIZUTANI, Akiko YOSHII, Tetsuya KAMIMURA, Tetsuya SHIMIZU