Patents by Inventor Akil K. Sutton

Akil K. Sutton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10551254
    Abstract: A ring oscillator system for characterizing substrate strain including, a substrate including a through-substrate-via, at least two ring oscillators, wherein a first ring oscillator is closer to the through-substrate-via than a second ring oscillator, and a logic difference circuit that is configured to receive an input from at least the first ring oscillator and the second ring oscillator, and detect a difference between the signal frequency of the first ring oscillator and the signal frequency of the second ring oscillator.
    Type: Grant
    Filed: March 21, 2018
    Date of Patent: February 4, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Chandrasekara Kothandaraman, Sami Rosenblatt, Akil K. Sutton
  • Publication number: 20180217012
    Abstract: A ring oscillator system for characterizing substrate strain including, a substrate including a through-substrate-via, at least two ring oscillators, wherein a first ring oscillator is closer to the through-substrate-via than a second ring oscillator, and a logic difference circuit that is configured to receive an input from at least the first ring oscillator and the second ring oscillator, and detect a difference between the signal frequency of the first ring oscillator and the signal frequency of the second ring oscillator.
    Type: Application
    Filed: March 21, 2018
    Publication date: August 2, 2018
    Inventors: Chandrasekara Kothandaraman, Sami Rosenblatt, Akil K. Sutton
  • Patent number: 9970830
    Abstract: A ring oscillator system for characterizing substrate strain including, a substrate including a through-substrate-via, at least two ring oscillators, wherein a first ring oscillator is closer to the through-substrate-via than a second ring oscillator, and a logic difference circuit that is configured to receive an input from at least the first ring oscillator and the second ring oscillator, and detect a difference between the signal frequency of the first ring oscillator and the signal frequency of the second ring oscillator.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: May 15, 2018
    Assignee: International Business Machines Corporation
    Inventors: Chandrasekara Kothandaraman, Sami Rosenblatt, Akil K. Sutton
  • Publication number: 20170356811
    Abstract: A ring oscillator system for characterizing substrate strain including, a substrate including a through-substrate-via, at least two ring oscillators, wherein a first ring oscillator is closer to the through-substrate-via than a second ring oscillator, and a logic difference circuit that is configured to receive an input from at least the first ring oscillator and the second ring oscillator, and detect a difference between the signal frequency of the first ring oscillator and the signal frequency of the second ring oscillator.
    Type: Application
    Filed: June 14, 2016
    Publication date: December 14, 2017
    Inventors: Chandrasekara Kothandaraman, Sami Rosenblatt, Akil K. Sutton
  • Patent number: 9659820
    Abstract: A method of forming a wavy line interconnect structure that accommodates small metal lines and enlarged diameter vias is disclosed. The enlarged diameter vias can be formed using a self-aligned dual damascene process without the need for a separate via lithography mask. The enlarged diameter vias make direct contact with at least three sides of the underlying metal lines, and can be aligned asymmetrically with respect to the metal line to increase the packing density of the metal pattern. The resulting vias have an aspect ratio that is relatively easy to fill, while the larger via footprint provides low via resistance. By allowing the via footprint to exceed the minimum size of the metal line width, a path is cleared for further process generations to continue shrinking metal lines to dimensions below 10 nm.
    Type: Grant
    Filed: May 2, 2016
    Date of Patent: May 23, 2017
    Assignees: International Business Machines Corporation, STMICROELECTRONICS, INC.
    Inventors: John H. Zhang, Lawrence A. Clevenger, Carl Radens, Yiheng Xu, Richard Stephen Wise, Akil K. Sutton, Terry Allen Spooner, Nicole A. Saulnier
  • Publication number: 20160247722
    Abstract: A wavy line interconnect structure that accommodates small metal lines and enlarged diameter vias is disclosed. The enlarged diameter vias can be formed using a self-aligned dual damascene process without the need for a separate via lithography mask. The enlarged diameter vias make direct contact with at least three sides of the underlying metal lines, and can be aligned asymmetrically with respect to the metal line to increase the packing density of the metal pattern. The resulting vias have an aspect ratio that is relatively easy to fill, while the larger via footprint provides low via resistance. An interconnect structure having enlarged diameter vias can also feature air gaps to reduce the chance of dielectric breakdown. By allowing the via footprint to exceed the minimum size of the metal line width, a path is cleared for further process generations to continue shrinking metal lines to dimensions below 10 nm.
    Type: Application
    Filed: May 2, 2016
    Publication date: August 25, 2016
    Inventors: John H. Zhang, Lawrence A. Clevenger, Carl Radens, Yiheng Xu, Richard Stephen Wise, Akil K. Sutton, Terry Allen Spooner, Nicole A. Saulnier
  • Patent number: 9391020
    Abstract: A wavy line interconnect structure that accommodates small metal lines and enlarged diameter vias is disclosed. The enlarged diameter vias can be formed using a self-aligned dual damascene process without the need for a separate via lithography mask. The enlarged diameter vias make direct contact with at least three sides of the underlying metal lines, and can be aligned asymmetrically with respect to the metal line to increase the packing density of the metal pattern. The resulting vias have an aspect ratio that is relatively easy to fill, while the larger via footprint provides low via resistance. An interconnect structure having enlarged diameter vias can also feature air gaps to reduce the chance of dielectric breakdown. By allowing the via footprint to exceed the minimum size of the metal line width, a path is cleared for further process generations to continue shrinking metal lines to dimensions below 10 nm.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: July 12, 2016
    Assignees: STMicroelectronics, Inc., International Business Machines Corporation
    Inventors: John H. Zhang, Lawrence A. Clevenger, Carl Radens, Yiheng Xu, Richard Stephen Wise, Akil K. Sutton, Terry Allen Spooner, Nicole A. Saulnier
  • Publication number: 20150279780
    Abstract: A wavy line interconnect structure that accommodates small metal lines and enlarged diameter vias is disclosed. The enlarged diameter vias can be formed using a self-aligned dual damascene process without the need for a separate via lithography mask. The enlarged diameter vias make direct contact with at least three sides of the underlying metal lines, and can be aligned asymmetrically with respect to the metal line to increase the packing density of the metal pattern. The resulting vias have an aspect ratio that is relatively easy to fill, while the larger via footprint provides low via resistance. An interconnect structure having enlarged diameter vias can also feature air gaps to reduce the chance of dielectric breakdown. By allowing the via footprint to exceed the minimum size of the metal line width, a path is cleared for further process generations to continue shrinking metal lines to dimensions below 10 nm.
    Type: Application
    Filed: June 25, 2014
    Publication date: October 1, 2015
    Inventors: John H. Zhang, Lawrence A. Clevenger, Carl Radens, Yiheng Xu, Richard Stephen Wise, Akil K. Sutton, Terry Allen SPOONER, Nicole A. SAULNIER
  • Publication number: 20140184242
    Abstract: A method and apparatus measure transistor bandwidth of a device under test in-line and on-wafer. The method includes disposing a measurement circuit on a chip within a wafer, the measurement circuit including a ring oscillator generating an oscillation frequency for transition through the device under test on the wafer, and obtaining an amplitude gain based on the measurement circuit for the corresponding frequency.
    Type: Application
    Filed: January 2, 2013
    Publication date: July 3, 2014
    Applicant: International Business Machines Corporation
    Inventors: Erik L. Hedberg, Daeik D. Kim, Dallas M. Lea, Akil K. Sutton, Steven J. Zier