Patents by Inventor Akimitsu Hatta

Akimitsu Hatta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050244324
    Abstract: By uniformly forming an indefinite number of microscopic acicular crystals on a surface of a silicon substrate so as to be perpendicular to the surface of the substrate by plasma CVD method using a catalyst, it is possible to reliably, homogeneously and massively form an ultramicroscopic acicular silicon crystal having a substantial cone shape tapered so as to have a radius of curvature of not less than 1 nm to no more than 20 nm at its tip end and having a diameter of bottom surface of not less than 10 nm, and a height equivalent to or more than the diameter of bottom surface, at a desired location.
    Type: Application
    Filed: September 4, 2003
    Publication date: November 3, 2005
    Applicants: Toshiba Ceramics Co., Ltd., Techno Network Shikoku Co., Ltd.
    Inventors: Akimitsu Hatta, Hiroaki Yoshimura, Keiichi Ishimoto, Hiroaki Kanakusa, Shinichi Kawagoe
  • Patent number: 6337060
    Abstract: The principal objects of the invention is to provide diamond fine particles with a surface nature so improved as to form a stable, uniform suspension or dispersion in a common medium such as water and alcohol. Another object is to provide an effective technique for producing hydrophilic diamond fine particles by chemically modifying the particle surface nature, while removing at the same time contaminants and foreign materials which coexist with the diamond. In the invention, diamond particles are treated by boiling in the treatment fluid of sulfuric acid solution, which is in particular of concentrated or fuming nature, at a temperature more than 200° C., which is preferably 250° C. or more.
    Type: Grant
    Filed: June 12, 1996
    Date of Patent: January 8, 2002
    Assignees: The Ishizuka Research Institute, Ltd.
    Inventors: Akio Hiraki, Toshimichi Ito, Akimitsu Hatta, Hiroshi Makita, Kazuhito Nishimura, Hiroshi Ishizuka, Satoru Hosomi
  • Patent number: 6008502
    Abstract: The present invention provides an electron emitting device for efficiently emitting electron beams by applying a forward bias to an MIS, pn, and a pin structure using a diamond layer so as to supply electrons from an electron supply layer to a p-type diamond layer. Furthermore, the present invention provides a method for easily and efficiently performing important production processes for producing a highly efficient electron emitting device having a diamond layer and controlling a surface state of the diamond layer. A multi-layer structure including an electrode layer, an electron supply layer and a diamond layer is used as the structure thereof. Alternatively, the electron affinity state of the surface of the diamond layer is arbitrarily controlled by a method such as ultraviolet ray irradiation.
    Type: Grant
    Filed: November 3, 1997
    Date of Patent: December 28, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masahiro Deguchi, Akio Hiraki, Toshimichi Ito, Akimitsu Hatta, Nobuhiro Eimori, Makoto Kitabatake