Abstract: The present invention relates to a compound having the general formula (1) wherein in the general formula (1) the residues R1 to R8 and Ar are the same or different and are independently from each other selected from the group consisting of hydrogen, unsubstituted hydrocarbon groups, substituted hydrocarbon groups and inorganic groups, wherein at least one of the residues R1 to R8 and Ar is a hydrophilic group, such as for instance a group comprising one or more polyethylene groups.

Abstract: The present invention relates to a compound having the general formula (1) wherein in the general formula (1) the residues R1 to R8 and Ar are the same or different and are independently from each other selected from the group consisting of hydrogen, unsubstituted hydrocarbon groups, substituted hydrocarbon groups and inorganic groups, wherein at least one of the residues R1 to R8 and Ar is a hydrophilic group, such as for instance a group comprising one or more polyethylene groups.

Abstract: The present invention relates to the use of a compound in single-molecule localization microscopy (SMLM), in stimulated emission depletion microscopy (STED), in minimal emission fluxes microscopy (MINFLUX) or in structured illumination and localization microscopy (SIMFLUX), wherein the compound is a substituted or unsubstituted polycyclic aromatic hydrocarbon comprising six or more substituted and/or unsubstituted aromatic hydrocarbon rings, wherein each of at least six of the six or more substituted and/or unsubstituted aromatic hydrocarbon rings is fused with at least another one of the at least six substituted and/or unsubstituted aromatic hydrocarbon rings.

Abstract: An oligophenylene monomer of general formula (I) wherein R1 and R2 are independently of each other H, halogene, —OH, —NH2, —CN, —NO2 or a linear or branched, saturated or unsaturated C1-C40 hydrocarbon residue, which can be substituted 1-to 5-fold with halogene (F, Cl, Br, I), —OH, —NH2, —CN and/or —NO2, and wherein one or more CH2-groups can be replaced by —O— or —S—, or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; and m represents 0, 1 or 2.

Abstract: The invention relates to oligophenylene monomers of general formula I, wherein R1 is H, halogene, —OH, —NH2, —CN, —NO2, or a linear or branched, saturated or un-saturated C1-C40 hydrocarbon residue, which can be substituted 1- to 5-fold with halogene (F, Cl, Br, I), —OH, —NH2, —CN and/or —NO2, and wherein one or more CH2-groups can be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR3—, wherein R3 is an optionally substituted C1-C40 hydrocarbon residue, or an optionally substituted aryl, al-kylaryl, alkoxyaryl, alkanoyl or aroyl residue; R2a and R2b are H, or optionally one or more of the pairs of adjacent R2a/R2b is joined to form a single bond in a six-membered carbocycle; m is an integer of from 0 to 3; n is 0 or 1; and X is halogene or trifluoromethylsulfonate, and Y is II; or X is II, and Y is halogene or trifluoromethylsulfonate.

Abstract: An oligophenylene monomer of general formula (I) wherein R1 and R2 are independently of each other H, halogene, —OH, —NH2, —CN, —NO2 or a linear or branched, saturated or unsaturated C1-C40 hydrocarbon residue, which can be substituted 1- to 5-fold with halogene (F, Cl, Br, I), —OH, —NH2, —CN and/or —NO2, and wherein one or more CH2-groups can be replaced by —O— or —S—, or an optionally substituted aryl, alkylaryl or alkoxyaryl residue; and m represents 0, 1 or 2.