Abstract: According to one aspect, the disclosure provides an image recording apparatus including a liquid supplying device. The liquid supplying device includes a tank, a cartridge, an atmospheric communication portion, and a recording portion. The tank has a second storage chamber configured to store liquid, a liquid passage in communication with the second storage chamber, and a gas passage in communication with the second storage chamber. The atmospheric communication portion includes a buffer tank defining a buffer chamber configured to store gas, a single communication flow passage allowing the buffer chamber to communicate with the second storage chamber, and an air communication passage allowing the buffer chamber to communicate with an atmosphere. When the cartridge is attached to the tank, the buffer chamber is positioned below the first storage chamber and the second storage chamber is positioned below the buffer chamber.

Abstract: A liquid supplying device includes a tank and a cartridge. The cartridge is configured to be detachably attached to the tank in an attachment-detachment direction crossing a vertical direction. The cartridge includes a first storage chamber. The tank includes a second storage chamber, a liquid passage, and a gas passage. The liquid passage has a first end, a second end, and a first extending portion. The second end is formed with a second opening open to an atmosphere. The first extending portion extends from the second opening in the attachment-detachment direction. The gas passage has a third end, a fourth end, and a second extending portion. The fourth end is formed with a fourth opening open to the atmosphere. The second extending portion extends from the fourth opening in the attachment-detachment direction. The second opening is at a position different from the fourth opening in the attachment-detachment direction.

Abstract: A power control unit includes a power module, a support block configured to support the power module, an upper case configured to cover the power module from above, and a connection conductor configured to connect an internal power feeding passage on the side of the power module and an external power feeding passage on the side of the motor unit, wherein the connection conductor vertically passes through the support block and includes a connecting fixing section that protrudes upward than the support block and that is connected to the internal power feeding passage by a fastening member, an inclination wall inclined downward toward a side end portion of the upper wall of the upper case is provided on the upper wall of the upper case, and an opening section facing the connecting fixing section of the connection conductor is provided in the inclination wall.

Abstract: A substrate processing apparatus includes a plurality of placement parts on which a substrate container is placed, a driving part configured to move the plurality of placement parts, a transport mechanism configured to load the substrate container into one of the plurality of placement parts and to unload the substrate container from one of the plurality of placement parts, and a controller configured to control the driving part and the transport mechanism so that by raising or lowering the transport mechanism while keeping a support of the transport mechanism unmoved in an initial position, the substrate container is delivered from one of the plurality of placement parts to the support of the transport mechanism, and the substrate container is delivered from the support of the transport mechanism to one of the plurality of placement parts.

Abstract: A transfer machine that charges a substrate contained in a substrate container to a substrate holder; a drive member that operates the transfer machine; and an operation controller that monitors whether a torque value detected from the drive member is kept within a torque limit value of the transfer machine by comparing the torque value with the torque limit value which is set individually for each of an interference area and a non-interference area excluding the interference area relative to conveyance operation in which the transfer machine is moved toward at least one of the substrate container and the substrate holder. The torque limit value in the non-interference area is set larger than the torque limit value in the interference area where a part of the transfer machine interferes with at least one of the substrate container and the substrate holder.

Abstract: A power control unit includes a power module, a support block configured to support the power module, an upper case configured to cover the power module from above, and a connection conductor configured to connect an internal power feeding passage on the side of the power module and an external power feeding passage on the side of the motor unit, wherein the connection conductor vertically passes through the support block and includes a connecting fixing section that protrudes upward than the support block and that is connected to the internal power feeding passage by a fastening member, an inclination wall inclined downward toward a side end portion of the upper wall of the upper case is provided on the upper wall of the upper case, and an opening section facing the connecting fixing section of the connection conductor is provided in the inclination wall.

Abstract: A power feed joint structure includes three module-side bus bars, three motor-side bus bar, three flexible conductive members configured to connect the module-side bus bars and the motor-side bus bars, a bus bar housing configured to hold the three motor-side bus bars, and an insulating cover member configured to restrict falling of the module-side bus bars. The module-side bus bars are connected to each of the internal power feeding passages of a power module, respectively. The motor-side bus bars are connected to each of the external power feeding passages of a motor unit, respectively.

Abstract: A substrate processing apparatus includes a plurality of placement parts on which a substrate container is placed, a driving part configured to move the plurality of placement parts, a transport mechanism configured to load the substrate container into one of the plurality of placement parts and to unload the substrate container from one of the plurality of placement parts, and a controller configured to control the driving pan and the transport mechanism so that by raising or lowering the transport mechanism while keeping a support of the transport mechanism unmoved in an initial position, the substrate container is delivered from one of the plurality of placement parts to the support of the transport mechanism, and the substrate container is delivered from the support of the transport mechanism to one of the plurality of placement parts.

Abstract: A substrate processing apparatus includes a plurality of placement parts on which a substrate container is placed, a driving part configured to move the plurality of placement parts, a transport mechanism configured to load the substrate container into one of the plurality of placement parts and to unload the substrate container from one of the plurality of placement parts, and a controller configured to control the driving part and the transport mechanism so that by raising or lowering the transport mechanism while keeping a support of the transport mechanism unmoved in an initial position, the substrate container is delivered from one of the plurality of placement parts to the support of the transport mechanism, and the substrate container is delivered from the support of the transport mechanism to one of the plurality of placement parts.

Abstract: A transfer machine that charges a substrate contained in a substrate container to a substrate holder; a drive member that operates the transfer machine; and an operation controller that monitors whether a torque value detected from the drive member is kept within a torque limit value of the transfer machine by comparing the torque value with the torque limit value which is set individually for each of an interference area and a non-interference area excluding the interference area relative to conveyance operation in which the transfer machine is moved toward at least one of the substrate container and the substrate holder. The torque limit value in the non-interference area is set larger than the torque limit value in the interference area where a part of the transfer machine interferes with at least one of the substrate container and the substrate holder.

Abstract: There is provided a technique that includes: a reaction chamber that processes a substrate on a substrate support; a transfer chamber; a gate that opens and closes an opening and is formed in the transfer chamber; a transfer device; a clean unit supplying a clean atmosphere to the transfer chamber; an inert gas supplier supplying an inert gas to the transfer chamber; and a controller controlling the inert gas supplier such that, after the loading of the substrate from a substrate container to the substrate support by the transfer device is completed and the gate is closed, the inert gas supplier supplies the inert gas during a time period until the gate is opened again and does not supply the inert gas in another time period, and control the transfer chamber to be kept at a positive pressure by an air atmosphere.

Abstract: There is provided a technique that includes: a reaction chamber that processes a substrate on a substrate support; a transfer chamber; a gate that opens and closes an opening and is formed in the transfer chamber; a transfer device; a clean unit supplying a clean atmosphere to the transfer chamber; an inert gas supplier supplying an inert gas to the transfer chamber; and a controller controlling the inert gas supplier such that, after the loading of the substrate from a substrate container to the substrate support by the transfer device is completed and the gate is closed, the inert gas supplier supplies the inert gas during a time period until the gate is opened again and does not supply the inert gas in another time period, and control the transfer chamber to be kept at a positive pressure by an air atmosphere.

Abstract: A substrate processing apparatus includes a plurality of placement parts on which a substrate container is placed, a driving part configured to move the plurality of placement parts, a transport mechanism configured to load the substrate container into one of the plurality of placement parts and to unload the substrate container from one of the plurality of placement parts, and a controller configured to control the driving pan and the transport mechanism so that by raising or lowering the transport mechanism while keeping a support of the transport mechanism unmoved in an initial position, the substrate container is delivered from one of the plurality of placement parts to the support of the transport mechanism, and the substrate container is delivered from the support of the transport mechanism to one of the plurality of placement parts.

Abstract: A substrate processing apparatus includes a processing vessel configured to process a substrate; a first purging part configured to perform a first purge to supply inert gas at a first flow rate into a substrate container accommodating the substrate; and a second purging part configured to perform a second purge to supply inert gas at a second flow rate into the substrate container, the second flow rate being lower than the first flow rate.

Abstract: The present invention provides a connection unit capable of accommodating nuts and showing sealing ability in a state installed on a housing. A connection unit S includes: a terminal block 100 having holes h3 at one side of for accommodating nuts n; a terminal-connecting portions 200 at least partially exposed when viewed from the other side and fixed to the terminal block 100 with the circumferences of the terminal-connecting portions 200 in tight contact with the terminal block 100; and a nut cover 300 for covering the nuts accommodated in the holes h3 for preventing the nuts n from coming off. The connection unit S further includes: guide grooves and guide ribs for restricting movement of the nut cover 300 relative to the terminal block 100; and locking hooks 116 and locking holes h5 for restricting movement of the nut cover 300 relative to the terminal block 100.

Abstract: The present invention provides a connection unit capable of accommodating nuts and showing sealing ability in a state installed on a housing. A connection unit S includes: a terminal block 100 having holes h3 at one side of for accommodating nuts n; a terminal-connecting portions 200 at least partially exposed when viewed from the other side and fixed to the terminal block 100 with the circumferences of the terminal-connecting portions 200 in tight contact with the terminal block 100; and a nut cover 300 for covering the nuts accommodated in the holes h3 for preventing the nuts n from coming off. The connection unit S further includes: guide grooves and guide ribs for restricting movement of the nut cover 300 relative to the terminal block 100; and locking hooks 116 and locking holes h5 for restricting movement of the nut cover 300 relative to the terminal block 100.

Abstract: Adverse effects when a carrier is open, such as particles adhesion to the substrate or natural oxidation film deposits on the substrate, as well as a rise in oxygen concentration and contamination of the substrate transfer chamber are prevented. Semiconductor manufacturing apparatus includes a carrier in which a cover unit is provided on a substrate loading/unloading opening for loading and unloading a substrate, a carrier open/close chamber continuously arranged to the carrier, a substrate transfer chamber continuously arranged to the carrier open/close chamber, a substrate processing chamber continuously arranged to the substrate transfer chamber, an exhaust means for exhausting the atmosphere in the carrier open/close chamber by suction, and an exhaust quantity adjuster means for adjusting the suction exhaust quantity of the exhaust means.

Abstract: A substrate processing apparatus includes a processing vessel configured to process a substrate; a first purging part configured to perform a first purge to supply inert gas at a first flow rate into a substrate container accommodating the substrate; and a second purging part configured to perform a second purge to supply inert gas at a second flow rate into the substrate container, the second flow rate being lower than the first flow rate.

Abstract: Adverse effects when a carrier is open, such as particles adhesion to the substrate or natural oxidation film deposits on the substrate, as well as a rise in oxygen concentration and contamination of the substrate transfer chamber are prevented. Semiconductor manufacturing apparatus includes a carrier in which a cover unit is provided on a substrate loading/unloading opening for loading and unloading a substrate, a carrier open/close chamber continuously arranged to the carrier, a substrate transfer chamber continuously arranged to the carrier open/close chamber, a substrate processing chamber continuously arranged to the substrate transfer chamber, an exhaust means for exhausting the atmosphere in the carrier open/close chamber by suction, and an exhaust quantity adjuster means for adjusting the suction exhaust quantity of the exhaust means.

Abstract: For an image forming apparatus including first and second storage chambers, an inequality expression of “R2>A×R1” is met. R1 is a sum of a passage resistance value obtained by flowing air through a first air communication portion and a passage resistance value obtained by flowing liquid through a supply portion. R2 is a passage resistance value obtained by flowing air through a second air communication portion. A is a cross-sectional area ratio obtained by dividing a first average cross-sectional area of a first space of the first storage chamber taken along a plurality of horizontal planes by a second average cross-sectional area of a second space of the second storage chamber taken along the plurality of horizontal planes. The first space contains at least a portion adjacent to the supply portion and accumulating the liquid. The second space contains at least a portion accumulating the liquid.